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Statements

Subject Item
n2:RIV%2F44555601%3A13430%2F01%3A00001468%21RIV%2F2002%2FMSM%2F134302%2FN
rdf:type
skos:Concept n17:Vysledek
dcterms:description
Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for a detection of oxidable gases. In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of tin films and next plasma oxidation of the metal films. The influence of technological parameters (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation) on the surface properties of the oxide films was studied by Atomic Force Microscopy (AFM). Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their properties and their good perfomance for a detection of oxidable gases. In this work, we have studied surface properties of SnO2 thin films produced by thermal evaporation of tin films and next plasma oxidation of the metal films. The influence of technological parameters (e.g. plasma parameters, oxidation time and voltage bias applied to the substrate during oxidation) on the surface properties of the oxide films was studied by Atomic Force Microscopy (AFM).
dcterms:title
Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation
skos:prefLabel
Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation Surface Properties of the Thin SnO2 Layers Prepared by Plasma Oxidation
skos:notation
RIV/44555601:13430/01:00001468!RIV/2002/MSM/134302/N
n4:strany
3279-3284
n4:aktivita
n11:P n11:Z
n4:aktivity
P(OC 527.50), Z(MSM 134300001)
n4:dodaniDat
n12:2002
n4:domaciTvurceVysledku
n5:8822646 n5:5664233
n4:druhVysledku
n20:D
n4:duvernostUdaju
n15:S
n4:entitaPredkladatele
n21:predkladatel
n4:idSjednocenehoVysledku
697938
n4:idVysledku
RIV/44555601:13430/01:00001468
n4:jazykVysledku
n19:eng
n4:klicovaSlova
Plasma oxidation, SnO2, AFM, surface roughness
n4:klicoveSlovo
n10:AFM n10:surface%20roughness n10:Plasma%20oxidation n10:SnO2
n4:kontrolniKodProRIV
[65770138D24B]
n4:mistoKonaniAkce
Orléans
n4:mistoVydani
Orléans
n4:nazevZdroje
Symposium proceedings 15th International Symposium on Plasma Chemistry, ISPC - 15
n4:obor
n8:BL
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
2
n4:pocetUcastnikuAkce
0
n4:pocetZahranicnichUcastnikuAkce
0
n4:projekt
n16:OC%20527.50
n4:rokUplatneniVysledku
n12:2001
n4:tvurceVysledku
Pavlík, Jaroslav Strýhal, Zdeněk
n4:typAkce
n14:WRD
n4:zahajeniAkce
2001-07-13+02:00
n4:zamer
n7:MSM%20134300001
s:numberOfPages
6
n13:hasPublisher
GREMI, CNRS/University of Orléans
n18:organizacniJednotka
13430