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Statements

Subject Item
n2:RIV%2F26821532%3A_____%2F11%3A%230000043%21RIV13-MPO-26821532
rdf:type
n13:Vysledek skos:Concept
rdfs:seeAlso
http://csacg.fzu.cz/
dcterms:description
We have investigated the TMAH etch conditions of the Si(110) wafers. We present data on the etch rates of the {110} and {111} planes for different composition of the TMAH etchant. We further discuss the characteristics of the masks from both material and crystallographic orientation points of view, which are needed for successful micromachining. We have investigated the TMAH etch conditions of the Si(110) wafers. We present data on the etch rates of the {110} and {111} planes for different composition of the TMAH etchant. We further discuss the characteristics of the masks from both material and crystallographic orientation points of view, which are needed for successful micromachining.
dcterms:title
Anisotropic etching of silicon by TMAH Anisotropic etching of silicon by TMAH
skos:prefLabel
Anisotropic etching of silicon by TMAH Anisotropic etching of silicon by TMAH
skos:notation
RIV/26821532:_____/11:#0000043!RIV13-MPO-26821532
n13:predkladatel
n14:ico%3A26821532
n3:aktivita
n19:P
n3:aktivity
P(FR-TI3/031)
n3:dodaniDat
n9:2013
n3:domaciTvurceVysledku
n12:8906793
n3:druhVysledku
n5:D
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
186301
n3:idVysledku
RIV/26821532:_____/11:#0000043
n3:jazykVysledku
n22:eng
n3:klicovaSlova
Silicon; TMAH; MEMS; crystallographic planes; etching
n3:klicoveSlovo
n10:MEMS n10:TMAH n10:crystallographic%20planes n10:Silicon n10:etching
n3:kontrolniKodProRIV
[53D1FC34962A]
n3:mistoKonaniAkce
Kežmarské Žlaby, Slovensko
n3:mistoVydani
Bratislava, Slovensko
n3:nazevZdroje
Proceedings of the 21th Joint Seminar Development of Materials Science in Research and Education
n3:obor
n21:JJ
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
1
n3:projekt
n7:FR-TI3%2F031
n3:rokUplatneniVysledku
n9:2011
n3:tvurceVysledku
Kostelník, Petr
n3:typAkce
n16:EUR
n3:zahajeniAkce
2011-01-01+01:00
s:numberOfPages
85
n11:hasPublisher
Slovak Society for Industrial Chemistry
n17:isbn
978-80-8134-002-4