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Statements

Subject Item
n2:RIV%2F00216305%3A26620%2F14%3APU109928%21RIV15-MSM-26620___
rdf:type
n5:Vysledek skos:Concept
dcterms:description
Gold clusters and nanoparticles on ultrathin oxide layers are used as catalysts and represent essential parts of plasmonic and electronic devices. The stability of these nanostructures at surfaces against the diffusion of their constituents into the bulk is therefore of vital importance regarding their long-term applicability. Here, on the basis of in situ X-ray photoelectron spectroscopy measurements of gold diffusion through ultrathin oxide layers (SiO2 and Al2O3) to a Si substrate, we show that the diffusion from gold clusters/islands into the bulk is a detachment-limited process. Hence, the ultrathin oxide acts principally as a layer preventing a direct contact of metal atoms with the silicon substrate rather than a diffusion barrier. These findings contribute to a quantitative understanding of general design rules of metal/oxide structures. Gold clusters and nanoparticles on ultrathin oxide layers are used as catalysts and represent essential parts of plasmonic and electronic devices. The stability of these nanostructures at surfaces against the diffusion of their constituents into the bulk is therefore of vital importance regarding their long-term applicability. Here, on the basis of in situ X-ray photoelectron spectroscopy measurements of gold diffusion through ultrathin oxide layers (SiO2 and Al2O3) to a Si substrate, we show that the diffusion from gold clusters/islands into the bulk is a detachment-limited process. Hence, the ultrathin oxide acts principally as a layer preventing a direct contact of metal atoms with the silicon substrate rather than a diffusion barrier. These findings contribute to a quantitative understanding of general design rules of metal/oxide structures.
dcterms:title
Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers
skos:prefLabel
Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers
skos:notation
RIV/00216305:26620/14:PU109928!RIV15-MSM-26620___
n3:aktivita
n18:P
n3:aktivity
P(ED1.1.00/02.0068), P(GAP102/12/1881), P(TE01020233)
n3:cisloPeriodika
31
n3:dodaniDat
n12:2015
n3:domaciTvurceVysledku
n9:9040188 n9:6804233 n9:5287081
n3:druhVysledku
n4:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n17:predkladatel
n3:idSjednocenehoVysledku
10562
n3:idVysledku
RIV/00216305:26620/14:PU109928
n3:jazykVysledku
n8:eng
n3:klicovaSlova
Oxide Layers, Diffusion, Gold Clusters, Nanoparticles, Atomic Layer Deposition, ALD, Surface Processes
n3:klicoveSlovo
n11:Diffusion n11:Surface%20Processes n11:Nanoparticles n11:ALD n11:Oxide%20Layers n11:Gold%20Clusters n11:Atomic%20Layer%20Deposition
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[3161C8E3C5C5]
n3:nazevZdroje
Journal of Physical Chemistry C (print)
n3:obor
n14:BM
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
3
n3:projekt
n6:ED1.1.00%2F02.0068 n6:GAP102%2F12%2F1881 n6:TE01020233
n3:rokUplatneniVysledku
n12:2014
n3:svazekPeriodika
118
n3:tvurceVysledku
Polčák, Josef Čechal, Jan Šikola, Tomáš
s:issn
1932-7447
s:numberOfPages
7
n10:organizacniJednotka
26620