This HTML5 document contains 47 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n17http://localhost/temp/predkladatel/
n10http://linked.opendata.cz/resource/domain/vavai/projekt/
n9http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n14http://linked.opendata.cz/ontology/domain/vavai/
shttp://schema.org/
n4http://linked.opendata.cz/ontology/domain/vavai/riv/
skoshttp://www.w3.org/2004/02/skos/core#
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n7http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n12http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F00216305%3A26620%2F14%3APU109363%21RIV15-MSM-26620___/
n13http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n11http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n16http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n6http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n15http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F00216305%3A26620%2F14%3APU109363%21RIV15-MSM-26620___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment. The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280 nm thick film exhibits only 20% thickness loss after 48 h immersion in water and still contains about 5 at% of the NHx environment.
dcterms:title
Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water
skos:prefLabel
Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization Towards Enhanced Layer Stability in Contact with Water
skos:notation
RIV/00216305:26620/14:PU109363!RIV15-MSM-26620___
n4:aktivita
n13:P
n4:aktivity
P(ED1.1.00/02.0068)
n4:cisloPeriodika
6
n4:dodaniDat
n15:2015
n4:domaciTvurceVysledku
n9:9040188 n9:5287081
n4:druhVysledku
n16:J
n4:duvernostUdaju
n18:S
n4:entitaPredkladatele
n12:predkladatel
n4:idSjednocenehoVysledku
34952
n4:idVysledku
RIV/00216305:26620/14:PU109363
n4:jazykVysledku
n11:eng
n4:klicovaSlova
amine coatings,cyclopropylamine,ESCA/XPS,FT-IR,pulsed discharges
n4:klicoveSlovo
n7:FT-IR n7:ESCA%2FXPS n7:amine%20coatings n7:pulsed%20discharges n7:cyclopropylamine
n4:kodStatuVydavatele
DE - Spolková republika Německo
n4:kontrolniKodProRIV
[3250658CF972]
n4:nazevZdroje
Plasma Processes and Polymers
n4:obor
n6:BL
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
8
n4:projekt
n10:ED1.1.00%2F02.0068
n4:rokUplatneniVysledku
n15:2014
n4:svazekPeriodika
11
n4:tvurceVysledku
Zajíčková, Lenka Manakhov, Anton Eliáš, Marek Polčák, Josef Nečas, David Hnilica, Jaroslav Bittnerová, Štěpánka Čechal, Jan
s:issn
1612-8850
s:numberOfPages
13
n17:organizacniJednotka
26620