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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F14%3APU113720%21RIV15-TA0-26310___
rdf:type
skos:Concept n15:Vysledek
dcterms:description
We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of 3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical properties of de We found out that the monomer deficient conditions enable to control mechanical and optical properties of plasma polymer films by RF power using plasma-enhanced chemical vapor deposition. The monomer deficient conditions may be characterized by the plasma process pressure (plasma switched on) lower than the basic process pressure (plasma switched off), which means that the concentration of reactive species is not insignificant or is even comparable with the concentration of monomer molecules. The monomer deficient conditions are achieved at lower monomer flow rates (0.5-10 sccm) operated at lower basic process pressures (1-5 Pa). In this study, we plasma polymerized tetravinylsilane at a mass flow rate of 3.8sccm operated at a basic process pressure of 3.0 Pa, and RF power ranging 10-70 W using continuous wave. The plasma process pressure decreased from 1.7 Pa (10 W) to 1.1 Pa (70 W) at enhanced power. The plasma species were monitored by mass spectrometry and correlated with chemical properties of de
dcterms:title
Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power
skos:prefLabel
Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power Monomer deficient conditions used to control physical properties of plasma polymer films in wide ranges by RF power
skos:notation
RIV/00216305:26310/14:PU113720!RIV15-TA0-26310___
n3:aktivita
n14:P
n3:aktivity
P(GCP205/12/J058), P(TA01010796)
n3:dodaniDat
n5:2015
n3:domaciTvurceVysledku
n7:2036126 Trivedi, Rutul Rajendra n7:6991637 n7:2834820
n3:druhVysledku
n13:O
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
30474
n3:idVysledku
RIV/00216305:26310/14:PU113720
n3:jazykVysledku
n17:eng
n3:klicovaSlova
thin films, plasma polymerization, optical properties, mechanical properties
n3:klicoveSlovo
n8:thin%20films n8:plasma%20polymerization n8:optical%20properties n8:mechanical%20properties
n3:kontrolniKodProRIV
[2B1CF368C7BC]
n3:obor
n6:CF
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n11:GCP205%2F12%2FJ058 n11:TA01010796
n3:rokUplatneniVysledku
n5:2014
n3:tvurceVysledku
Hoferek, Lukáš Čech, Vladimír Kontárová, Soňa Trivedi, Rutul Rajendra
n16:organizacniJednotka
26310