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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F12%3APU99244%21RIV13-MSM-26310___
rdf:type
n12:Vysledek skos:Concept
dcterms:description
The plasma chemical removal of the corrosion layers from archaeological artifacts by RF hydrogen low pressure plasma is a relatively new technique discovered at mid 80's. Because each object is original with the unique composition of corrosion layers as well corrosion history the model corroded samples were used for the presented study. The different duty cycles were applied to keep low temperature of samples. The second plasma application in the conservation is deposition of thin layers protecting the objects from the secondary corrosion. The organosilicone and parylene thin films were applied. The plasma chemical removal of the corrosion layers from archaeological artifacts by RF hydrogen low pressure plasma is a relatively new technique discovered at mid 80's. Because each object is original with the unique composition of corrosion layers as well corrosion history the model corroded samples were used for the presented study. The different duty cycles were applied to keep low temperature of samples. The second plasma application in the conservation is deposition of thin layers protecting the objects from the secondary corrosion. The organosilicone and parylene thin films were applied.
dcterms:title
Plasma Treatment of Metallic Artefacts Plasma Treatment of Metallic Artefacts
skos:prefLabel
Plasma Treatment of Metallic Artefacts Plasma Treatment of Metallic Artefacts
skos:notation
RIV/00216305:26310/12:PU99244!RIV13-MSM-26310___
n12:predkladatel
n13:orjk%3A26310
n4:aktivita
n16:S
n4:aktivity
S
n4:dodaniDat
n7:2013
n4:domaciTvurceVysledku
n5:6475876 n5:7294697 n5:1412884 n5:2888165 n5:8194041 n5:1238043
n4:druhVysledku
n14:O
n4:duvernostUdaju
n11:S
n4:entitaPredkladatele
n6:predkladatel
n4:idSjednocenehoVysledku
158871
n4:idVysledku
RIV/00216305:26310/12:PU99244
n4:jazykVysledku
n17:eng
n4:klicovaSlova
low pressure hydrogen plasma, SiOx plasma deposition, parylene thin films
n4:klicoveSlovo
n9:low%20pressure%20hydrogen%20plasma n9:SiOx%20plasma%20deposition n9:parylene%20thin%20films
n4:kontrolniKodProRIV
[C733B399727F]
n4:obor
n15:BL
n4:pocetDomacichTvurcuVysledku
6
n4:pocetTvurcuVysledku
6
n4:rokUplatneniVysledku
n7:2012
n4:tvurceVysledku
Procházka, Michal Fojtíková, Petra Přikryl, Radek Balaštíková, Radka Sázavská, Věra Krčma, František
n10:organizacniJednotka
26310