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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F12%3APU105243%21RIV15-MSM-26310___
rdf:type
n7:Vysledek skos:Concept
dcterms:description
This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined. This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.
dcterms:title
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
skos:prefLabel
Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process
skos:notation
RIV/00216305:26310/12:PU105243!RIV15-MSM-26310___
n3:aktivita
n8:I
n3:aktivity
I
n3:dodaniDat
n14:2015
n3:domaciTvurceVysledku
n11:9496513 n11:2888165 n11:8194041 n11:7294697
n3:druhVysledku
n9:O
n3:duvernostUdaju
n4:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
158854
n3:idVysledku
RIV/00216305:26310/12:PU105243
n3:jazykVysledku
n5:eng
n3:klicovaSlova
Thin film deposition, optical emission spectroscopy, oxygen transmission rate
n3:klicoveSlovo
n12:Thin%20film%20deposition n12:oxygen%20transmission%20rate n12:optical%20emission%20spectroscopy
n3:kontrolniKodProRIV
[F4B2F12F7818]
n3:obor
n6:AC
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:rokUplatneniVysledku
n14:2012
n3:tvurceVysledku
Přikryl, Radek Krčma, František Blahová, Lucie Procházka, Michal
n15:organizacniJednotka
26310