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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F11%3APU96903%21RIV13-AV0-26310___
rdf:type
n12:Vysledek skos:Concept
dcterms:description
Plasma-polymerized tetravinylsilane films deposited on silicon wafers by PECVD at different powers using pulsed plasma were analyzed by both typical conventional depth sensing and by cyclic nanoindentation. A comparative study of the two methods was carried out under reduced system drift. It was found that cyclic nanoindentation is a reproducible technique enabling reliable construction of the depth profile of mechanical properties to the same degree of accuracy as conventional nanoindentation but considerably faster. The Youngs modulus (7.9-17 GPa) and hardness (0.69-3.0 GPa) of films were controlled by the effective power (0.1-10 W). Conditions for appropriate depth analysis of mechanical properties at shallow depth and the limited applicability of the 10% rule are also discussed. Plasma-polymerized tetravinylsilane films deposited on silicon wafers by PECVD at different powers using pulsed plasma were analyzed by both typical conventional depth sensing and by cyclic nanoindentation. A comparative study of the two methods was carried out under reduced system drift. It was found that cyclic nanoindentation is a reproducible technique enabling reliable construction of the depth profile of mechanical properties to the same degree of accuracy as conventional nanoindentation but considerably faster. The Youngs modulus (7.9-17 GPa) and hardness (0.69-3.0 GPa) of films were controlled by the effective power (0.1-10 W). Conditions for appropriate depth analysis of mechanical properties at shallow depth and the limited applicability of the 10% rule are also discussed.
dcterms:title
Depth profile of mechanical properties of plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation Depth profile of mechanical properties of plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation
skos:prefLabel
Depth profile of mechanical properties of plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation Depth profile of mechanical properties of plasma-polymerized tetravinylsilane films evaluated by cyclic nanoindentation
skos:notation
RIV/00216305:26310/11:PU96903!RIV13-AV0-26310___
n12:predkladatel
n13:orjk%3A26310
n3:aktivita
n14:P
n3:aktivity
P(GD104/09/H080), P(KAN101120701), P(ME09061)
n3:cisloPeriodika
S2
n3:dodaniDat
n18:2013
n3:domaciTvurceVysledku
n10:2036126 Trivedi, Rutul Rajendra n10:2834820
n3:druhVysledku
n6:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
193401
n3:idVysledku
RIV/00216305:26310/11:PU96903
n3:jazykVysledku
n8:eng
n3:klicovaSlova
Thin film, plasma polymerization, nanoindentation, Youngs modulus, hardness
n3:klicoveSlovo
n4:Thin%20film n4:hardness n4:Youngs%20modulus n4:plasma%20polymerization n4:nanoindentation
n3:kodStatuVydavatele
CZ - Česká republika
n3:kontrolniKodProRIV
[99C21D5713FB]
n3:nazevZdroje
Surface and Coatings Technology
n3:obor
n17:CF
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
3
n3:projekt
n9:KAN101120701 n9:GD104%2F09%2FH080 n9:ME09061
n3:rokUplatneniVysledku
n18:2011
n3:svazekPeriodika
205
n3:tvurceVysledku
Hoferek, Lukáš Čech, Vladimír Trivedi, Rutul Rajendra
s:issn
0257-8972
s:numberOfPages
5
n7:organizacniJednotka
26310