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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F11%3APU96898%21RIV13-AV0-26310___
rdf:type
n14:Vysledek skos:Concept
dcterms:description
Continuous stiffness measurement (CSM) and dynamic contact module (DCM) nanoindentation measurements were used to characterize the mechanical properties of plasma-polymerized tetravinylsilane films deposited by PECVD at RF powers ranging from 10 to 70 W. The Youngs modulus and hardness as a function of the indenter displacement (5-500 nm) were investigated for films of 1-micron thickness. The Youngs modulus (hardness) was observed to increase from 8.3 GPa (0.9 GPa) to 58 GPa (9.5 GPa) with enhanced RF power. Nanoindentation analysis together with AFM imaging revealed a grain character of films deposited at a higher power. Finite element analysis was used to simulate nanoindentation measurements and evaluate properties of the elastic-plastic material. Continuous stiffness measurement (CSM) and dynamic contact module (DCM) nanoindentation measurements were used to characterize the mechanical properties of plasma-polymerized tetravinylsilane films deposited by PECVD at RF powers ranging from 10 to 70 W. The Youngs modulus and hardness as a function of the indenter displacement (5-500 nm) were investigated for films of 1-micron thickness. The Youngs modulus (hardness) was observed to increase from 8.3 GPa (0.9 GPa) to 58 GPa (9.5 GPa) with enhanced RF power. Nanoindentation analysis together with AFM imaging revealed a grain character of films deposited at a higher power. Finite element analysis was used to simulate nanoindentation measurements and evaluate properties of the elastic-plastic material.
dcterms:title
Mechanical properties of plasma-polymerized tetravinylsilane films Mechanical properties of plasma-polymerized tetravinylsilane films
skos:prefLabel
Mechanical properties of plasma-polymerized tetravinylsilane films Mechanical properties of plasma-polymerized tetravinylsilane films
skos:notation
RIV/00216305:26310/11:PU96898!RIV13-AV0-26310___
n14:predkladatel
n15:orjk%3A26310
n3:aktivita
n4:P
n3:aktivity
P(KAN101120701), P(ME09061)
n3:cisloPeriodika
2
n3:dodaniDat
n8:2013
n3:domaciTvurceVysledku
n13:2036126 n13:9145087
n3:druhVysledku
n18:J
n3:duvernostUdaju
n17:S
n3:entitaPredkladatele
n6:predkladatel
n3:idSjednocenehoVysledku
211251
n3:idVysledku
RIV/00216305:26310/11:PU96898
n3:jazykVysledku
n9:eng
n3:klicovaSlova
mechanical properties, nanoindentation, organosilicon precursors, plasma-enhanced chemical vapor deposition (PECVD), thin films
n3:klicoveSlovo
n10:mechanical%20properties n10:nanoindentation n10:organosilicon%20precursors n10:plasma-enhanced%20chemical%20vapor%20deposition%20%28PECVD%29 n10:thin%20films
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[FA1ACD4B0B4E]
n3:nazevZdroje
Plasma Processes and Polymers
n3:obor
n11:CF
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:projekt
n16:KAN101120701 n16:ME09061
n3:rokUplatneniVysledku
n8:2011
n3:svazekPeriodika
8
n3:tvurceVysledku
Lasota, Tomáš Drzal, Lawrence Čech, Vladimír
s:issn
1612-8850
s:numberOfPages
9
n19:organizacniJednotka
26310