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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F11%3APU93873%21RIV12-MSM-26310___
rdf:type
n6:Vysledek skos:Concept
dcterms:description
PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane. PECVD of hexamethyldisiloxane was performed in order to study dependence of the process on duty cycle. Capacitively coupled plasma was measured via optical emission spectroscopy. Experiment shows that dependence of fragment populations on duty cycle was increasing with increasing duty cycle in the case of constant supplied power, however, there was a maximum detected at 30 % in the case of constant mean power. This point might be an optimal setup for the deposition of SiO2 thin films from hexamethyldisiloxane.
dcterms:title
Pulse mode in plasma polymerization of hexamethyldisiloxane Pulse mode in plasma polymerization of hexamethyldisiloxane
skos:prefLabel
Pulse mode in plasma polymerization of hexamethyldisiloxane Pulse mode in plasma polymerization of hexamethyldisiloxane
skos:notation
RIV/00216305:26310/11:PU93873!RIV12-MSM-26310___
n6:predkladatel
n7:orjk%3A26310
n4:aktivita
n5:S n5:Z
n4:aktivity
S, Z(MSM0021630501)
n4:dodaniDat
n13:2012
n4:domaciTvurceVysledku
n16:9496513 n16:2888165 n16:7294697
n4:druhVysledku
n14:O
n4:duvernostUdaju
n17:S
n4:entitaPredkladatele
n12:predkladatel
n4:idSjednocenehoVysledku
225256
n4:idVysledku
RIV/00216305:26310/11:PU93873
n4:jazykVysledku
n15:eng
n4:klicovaSlova
Optical emission spectroscopy, Hexamethyldisiloxane, Thin film deposition
n4:klicoveSlovo
n10:Hexamethyldisiloxane n10:Thin%20film%20deposition n10:Optical%20emission%20spectroscopy
n4:kontrolniKodProRIV
[8936C2508905]
n4:obor
n9:BL
n4:pocetDomacichTvurcuVysledku
3
n4:pocetTvurcuVysledku
3
n4:rokUplatneniVysledku
n13:2011
n4:tvurceVysledku
Procházka, Michal Krčma, František Blahová, Lucie
n4:zamer
n18:MSM0021630501
n11:organizacniJednotka
26310