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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F05%3APU52892%21RIV06-MSM-26310___
rdf:type
skos:Concept n15:Vysledek
dcterms:description
Elastic thin films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system. An effective power density ranging from 8 . 10-4 to 0.3 W cm-3 was used to control the Young's modulus of films to a range of 3.7 - 11.3 GPa. The modulus decreased slightly with the film thickness varying from 80 nm to 1.5 microns for films prepared under the same deposition conditions. The hardness of films (0.7 - 2.1 GPa) was proportional to the Young's modulus with a relatively high ratio of 0.185 associated with a higher mean compressive elastic strain with respect to other groups of plasma polymers (0.059 - 0.115). Thin films exhibited an abrupt increase in hardness at the film surface relat ed to post-deposition oxidation. Elastic thin films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system. An effective power density ranging from 8 . 10-4 to 0.3 W cm-3 was used to control the Young's modulus of films to a range of 3.7 - 11.3 GPa. The modulus decreased slightly with the film thickness varying from 80 nm to 1.5 microns for films prepared under the same deposition conditions. The hardness of films (0.7 - 2.1 GPa) was proportional to the Young's modulus with a relatively high ratio of 0.185 associated with a higher mean compressive elastic strain with respect to other groups of plasma polymers (0.059 - 0.115). Thin films exhibited an abrupt increase in hardness at the film surface relat ed to post-deposition oxidation. Vybrané mechanické vlastnosti (modul pružnosti, tvrdost) pp-VTES vrstev lze řídit pomocí výkonu pulzního plazmatu.
dcterms:title
RF-power-controlled Young's modulus of plasma-polymerized organosilicon films RF-power-controlled Young's modulus of plasma-polymerized organosilicon films Youngův modul pružnosti v plazmových polymerů na bázi organokřemičitanů řízený RF výkonem
skos:prefLabel
RF-power-controlled Young's modulus of plasma-polymerized organosilicon films Youngův modul pružnosti v plazmových polymerů na bázi organokřemičitanů řízený RF výkonem RF-power-controlled Young's modulus of plasma-polymerized organosilicon films
skos:notation
RIV/00216305:26310/05:PU52892!RIV06-MSM-26310___
n3:strany
5099-5102
n3:aktivita
n16:P
n3:aktivity
P(1P05OC087), P(GA104/03/0236), P(OC 527.110)
n3:cisloPeriodika
18
n3:dodaniDat
n5:2006
n3:domaciTvurceVysledku
n12:2201976 n12:2036126
n3:druhVysledku
n17:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n9:predkladatel
n3:idSjednocenehoVysledku
541107
n3:idVysledku
RIV/00216305:26310/05:PU52892
n3:jazykVysledku
n18:eng
n3:klicovaSlova
CVD; thin film; nanoindentation; mechanical properties; organosilicon
n3:klicoveSlovo
n4:mechanical%20properties n4:organosilicon n4:CVD n4:thin%20film n4:nanoindentation
n3:kodStatuVydavatele
CZ - Česká republika
n3:kontrolniKodProRIV
[AD10E0E9BD45]
n3:nazevZdroje
Journal of Materials Science
n3:obor
n14:JI
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
4
n3:projekt
n7:GA104%2F03%2F0236 n7:OC%20527.110 n7:1P05OC087
n3:rokUplatneniVysledku
n5:2005
n3:svazekPeriodika
40
n3:tvurceVysledku
Goruppa, Alexander Čech, Vladimír Vaněk, Jan Jones, Frank
s:issn
0022-2461
s:numberOfPages
4
n8:organizacniJednotka
26310