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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F03%3APU38788%21RIV06-GA0-26310___
rdf:type
skos:Concept n18:Vysledek
dcterms:description
Plasma-polymerized thin films of vinyltriethoxysilane have been prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling pulsed-plasma system. Thin films of the thickness ranging from 80 nm to 1.5 um were subjected to nanoindentation measurements. The Youngs modulus determined from the indentation load-displacement curve has increased with the effective power used from 4 GPa to 11 GPa. Thin films have exhibited an abrupt increase of the hardness at the film surface.. Plasma-polymerized thin films of vinyltriethoxysilane have been prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling pulsed-plasma system. Thin films of the thickness ranging from 80 nm to 1.5 um were subjected to nanoindentation measurements. The Youngs modulus determined from the indentation load-displacement curve has increased with the effective power used from 4 GPa to 11 GPa. Thin films have exhibited an abrupt increase of the hardness at the film surface.. Byly sledovány a ovlivňovány mechanické vlastnosti plazmového polymeru připraveného v pulzním plazmatu z vinyltrietoxysilanu
dcterms:title
Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane Mechanické vlastnosti plazmového polymeru připraveného v pulzním plazmatu z vinyltrietoxysilanu Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane
skos:prefLabel
Mechanické vlastnosti plazmového polymeru připraveného v pulzním plazmatu z vinyltrietoxysilanu Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane Mechanical properties of pulsed-plasma polymerized vinyltriethoxysilane
skos:notation
RIV/00216305:26310/03:PU38788!RIV06-GA0-26310___
n4:strany
461-466
n4:aktivita
n11:P
n4:aktivity
P(GA104/00/0708), P(OC 527.110)
n4:dodaniDat
n19:2006
n4:domaciTvurceVysledku
n10:2201976 n10:2036126
n4:druhVysledku
n16:D
n4:duvernostUdaju
n7:S
n4:entitaPredkladatele
n5:predkladatel
n4:idSjednocenehoVysledku
614666
n4:idVysledku
RIV/00216305:26310/03:PU38788
n4:jazykVysledku
n17:eng
n4:klicovaSlova
VTEO, pulsed plasma, vinyltriethoxysilane, Young modulus
n4:klicoveSlovo
n6:VTEO n6:Young%20modulus n6:pulsed%20plasma n6:vinyltriethoxysilane
n4:kontrolniKodProRIV
[789CA736405D]
n4:mistoKonaniAkce
Taormina
n4:mistoVydani
Bari
n4:nazevZdroje
16th International Symposium on Plasma Chemistry
n4:obor
n14:BL
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
4
n4:projekt
n13:OC%20527.110 n13:GA104%2F00%2F0708
n4:rokUplatneniVysledku
n19:2003
n4:tvurceVysledku
Čech, Vladimír Vaněk, Jan Goruppa, Alexander Jones, Frank
n4:typAkce
n20:WRD
n4:zahajeniAkce
2003-06-21+02:00
s:numberOfPages
6
n9:hasPublisher
Department of chemistry, University of Bari
n15:organizacniJednotka
26310