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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F03%3APU38246%21RIV%2F2004%2FMSM%2F263104%2FN
rdf:type
skos:Concept n18:Vysledek
dcterms:description
The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and ?×-metacryloxyprophyltrimethoxysilane. The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and ?×-metacryloxyprophyltrimethoxysilane.
dcterms:title
Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films
skos:prefLabel
Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films
skos:notation
RIV/00216305:26310/03:PU38246!RIV/2004/MSM/263104/N
n4:strany
1-6
n4:aktivita
n15:Z
n4:aktivity
Z(MSM 263100019)
n4:dodaniDat
n5:2004
n4:domaciTvurceVysledku
n8:5127416 n8:8194041 n8:2201976 n8:6073387 n8:2036126 n8:2888165 n8:8402620
n4:druhVysledku
n10:D
n4:duvernostUdaju
n16:S
n4:entitaPredkladatele
n12:predkladatel
n4:idSjednocenehoVysledku
628164
n4:idVysledku
RIV/00216305:26310/03:PU38246
n4:jazykVysledku
n9:eng
n4:klicovaSlova
Plasma thin layer deposition, organosilicone films, optical emission spectroscopy
n4:klicoveSlovo
n11:Plasma%20thin%20layer%20deposition n11:organosilicone%20films n11:optical%20emission%20spectroscopy
n4:kontrolniKodProRIV
[D171B1D90B4D]
n4:mistoKonaniAkce
Taormina
n4:mistoVydani
Taormina
n4:nazevZdroje
Proceedings of ISPC XVI
n4:obor
n19:BL
n4:pocetDomacichTvurcuVysledku
7
n4:pocetTvurcuVysledku
7
n4:pocetUcastnikuAkce
0
n4:pocetZahranicnichUcastnikuAkce
0
n4:rokUplatneniVysledku
n5:2003
n4:tvurceVysledku
Krčma, František Rašková, Zuzana Havelková, Iveta Přikryl, Radek Šormová, Hana Vaněk, Jan Čech, Vladimír
n4:typAkce
n13:WRD
n4:zahajeniAkce
2003-06-21+02:00
n4:zamer
n7:MSM%20263100019
s:numberOfPages
6
n14:hasPublisher
IUPAC
n20:organizacniJednotka
26310