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Statements

Subject Item
n2:RIV%2F00216305%3A26310%2F03%3APU38240%21RIV%2F2004%2FMSM%2F263104%2FN
rdf:type
n10:Vysledek skos:Concept
dcterms:description
The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies. The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharrge parameters and the final layer properties will be subject of the following studies.
dcterms:title
Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films
skos:prefLabel
Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films
skos:notation
RIV/00216305:26310/03:PU38240!RIV/2004/MSM/263104/N
n3:strany
222-223
n3:aktivita
n4:Z
n3:aktivity
Z(MSM 263100019)
n3:dodaniDat
n13:2004
n3:domaciTvurceVysledku
n6:2888165 n6:8194041 n6:8402620 n6:5127416 n6:2201976 n6:6073387 n6:2036126
n3:druhVysledku
n15:D
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n21:predkladatel
n3:idSjednocenehoVysledku
628166
n3:idVysledku
RIV/00216305:26310/03:PU38240
n3:jazykVysledku
n14:eng
n3:klicovaSlova
Plasma deposition, organosilikone layers, optical emission spectroscopy
n3:klicoveSlovo
n16:organosilikone%20layers n16:optical%20emission%20spectroscopy n16:Plasma%20deposition
n3:kontrolniKodProRIV
[535AD4DE9573]
n3:mistoKonaniAkce
Bobrovník
n3:mistoVydani
Bratislava
n3:nazevZdroje
Proceedings of 14th Symposium on Application of Plasma Processes
n3:obor
n9:BL
n3:pocetDomacichTvurcuVysledku
7
n3:pocetTvurcuVysledku
7
n3:pocetUcastnikuAkce
0
n3:pocetZahranicnichUcastnikuAkce
0
n3:rokUplatneniVysledku
n13:2003
n3:tvurceVysledku
Přikryl, Radek Čech, Vladimír Šormová, Hana Vaněk, Jan Krčma, František Rašková, Zuzana Havelková, Iveta
n3:typAkce
n20:EUR
n3:zahajeniAkce
2003-01-13+01:00
n3:zamer
n12:MSM%20263100019
s:numberOfPages
2
n19:hasPublisher
Slovenská akadémia vied
n17:isbn
80-8040-195-0
n18:organizacniJednotka
26310