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Statements

Subject Item
n2:RIV%2F00216305%3A26220%2F14%3APU109929%21RIV15-MSM-26220___
rdf:type
n9:Vysledek skos:Concept
dcterms:description
The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis). The paper deals with AFM imaging and characterization of 3D surface morphology of aluminum nitride (AlN) epilayers on sapphire substrates prepared by magnetron sputtering. Due to the effect of temperature changes on epilayer's surface during the fabrication, a surface morphology is studied by combination of atomic force microscopy (AFM) and fractal analysis methods. Both methods are useful tools that may assist manufacturers in developing and fabricating AlN thin films with optimal surface characteristics. Furthermore, they provide different yet complementary information to that offered by traditional surface statistical parameters. This combination is used for the first time for measurement on AlN epilayers on sapphire substrates, and provides the overall 3D morphology of the sample surfaces (by AFM imaging), and reveals fractal characteristics in the surface morphology (fractal analysis).
dcterms:title
AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates
skos:prefLabel
AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates AFM imaging and fractal analysis of surface roughness of AlN epilayers on sapphire substrates
skos:notation
RIV/00216305:26220/14:PU109929!RIV15-MSM-26220___
n3:aktivita
n11:S n11:P
n3:aktivity
P(ED1.1.00/02.0068), P(ED2.1.00/03.0072), S
n3:cisloPeriodika
312
n3:dodaniDat
n10:2015
n3:domaciTvurceVysledku
n13:2108585 n13:6493645 n13:2967677 Dallaeva, Dinara
n3:druhVysledku
n8:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
1807
n3:idVysledku
RIV/00216305:26220/14:PU109929
n3:jazykVysledku
n19:eng
n3:klicovaSlova
Aluminum nitride, Epitaxy, Substrate, Surface roughness, Atomic force microscopy, Fractal analysis
n3:klicoveSlovo
n6:Fractal%20analysis n6:Epitaxy n6:Atomic%20force%20microscopy n6:Aluminum%20nitride n6:Surface%20roughness n6:Substrate
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[4B1FB359C45D]
n3:nazevZdroje
Applied Surface Science
n3:obor
n16:JA
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
6
n3:projekt
n17:ED1.1.00%2F02.0068 n17:ED2.1.00%2F03.0072
n3:rokUplatneniVysledku
n10:2014
n3:svazekPeriodika
312
n3:tvurceVysledku
Tománek, Pavel Grmela, Lubomír Dallaeva, Dinara Talu, Stefan Škarvada, Pavel Stach, Sebastian
s:issn
0169-4332
s:numberOfPages
6
n7:doi
10.1016/j.apsusc.2014.05.086
n14:organizacniJednotka
26220