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Statements

Subject Item
n2:RIV%2F00216305%3A26220%2F13%3APU106997%21RIV14-MSM-26220___
rdf:type
skos:Concept n3:Vysledek
dcterms:description
The article deals with photo-reflective layer on Low-Temperature Co-Fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way. The article deals with photo-reflective layer on Low-Temperature Co-Fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.
dcterms:title
Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications
skos:prefLabel
Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications Photo-reflective layer on Low Temperature Co-fired Ceramic for optical applications
skos:notation
RIV/00216305:26220/13:PU106997!RIV14-MSM-26220___
n3:predkladatel
n4:orjk%3A26220
n6:aktivita
n19:S
n6:aktivity
S
n6:cisloPeriodika
1
n6:dodaniDat
n14:2014
n6:domaciTvurceVysledku
n10:9857184 n10:7567375 n10:3956733 n10:6883524 n10:8549176 n10:4489705
n6:druhVysledku
n8:J
n6:duvernostUdaju
n12:S
n6:entitaPredkladatele
n18:predkladatel
n6:idSjednocenehoVysledku
96127
n6:idVysledku
RIV/00216305:26220/13:PU106997
n6:jazykVysledku
n17:eng
n6:klicovaSlova
LTCC, thick-film, thin-film, diffusion and specular reflectance, roughness, surface.
n6:klicoveSlovo
n7:diffusion%20and%20specular%20reflectance n7:thick-film n7:thin-film n7:roughness n7:LTCC n7:surface.
n6:kodStatuVydavatele
CH - Švýcarská konfederace
n6:kontrolniKodProRIV
[44E435D9F444]
n6:nazevZdroje
Key Engineering Materials (print)
n6:obor
n15:JA
n6:pocetDomacichTvurcuVysledku
6
n6:pocetTvurcuVysledku
6
n6:rokUplatneniVysledku
n14:2013
n6:svazekPeriodika
592-593
n6:tvurceVysledku
Holík, Milan Klíma, Martin Szendiuch, Ivan Svatoš, Vojtěch Hubálek, Jaromír Urban, František
s:issn
1013-9826
s:numberOfPages
4
n13:doi
10.4028/www.scientific.net/KEM.592-593.457
n16:organizacniJednotka
26220