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Statements

Subject Item
n2:RIV%2F00216305%3A26220%2F09%3APU81713%21RIV10-MSM-26220___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
This paper deals with structural and optical properties of sputtered thin yttrium-oxide layers. Yttrium oxide is one of the materials which can be used as the antireflection coating for silicon solar cells. Its advantages are mainly a good thermal stability and a suitable refraction index. The yttrium oxide layers were deposited by means of RF magnetron sputtering system in non-reactive mode from yttrium-oxide target. A main aim was focused on evaluation of deposited layers by using UV-VIS spectrophotometry. This paper deals with structural and optical properties of sputtered thin yttrium-oxide layers. Yttrium oxide is one of the materials which can be used as the antireflection coating for silicon solar cells. Its advantages are mainly a good thermal stability and a suitable refraction index. The yttrium oxide layers were deposited by means of RF magnetron sputtering system in non-reactive mode from yttrium-oxide target. A main aim was focused on evaluation of deposited layers by using UV-VIS spectrophotometry.
dcterms:title
Yttrium Oxide Layers for Antireflection Coating of Silicon Solar Cells Yttrium Oxide Layers for Antireflection Coating of Silicon Solar Cells
skos:prefLabel
Yttrium Oxide Layers for Antireflection Coating of Silicon Solar Cells Yttrium Oxide Layers for Antireflection Coating of Silicon Solar Cells
skos:notation
RIV/00216305:26220/09:PU81713!RIV10-MSM-26220___
n4:aktivita
n16:Z
n4:aktivity
Z(MSM0021630503)
n4:dodaniDat
n7:2010
n4:domaciTvurceVysledku
n15:4619773
n4:druhVysledku
n10:D
n4:duvernostUdaju
n18:S
n4:entitaPredkladatele
n13:predkladatel
n4:idSjednocenehoVysledku
352193
n4:idVysledku
RIV/00216305:26220/09:PU81713
n4:jazykVysledku
n8:eng
n4:klicovaSlova
yttrium oxide, magnetron sputtering, antireflection coating, optical properties
n4:klicoveSlovo
n5:optical%20properties n5:yttrium%20oxide n5:magnetron%20sputtering n5:antireflection%20coating
n4:kontrolniKodProRIV
[CE10F0949762]
n4:mistoKonaniAkce
Brno
n4:mistoVydani
Brno
n4:nazevZdroje
EDS 09 IMAPS CS INTERNATIONAL CONFERENCE PROCEEDINGS
n4:obor
n11:JA
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
3
n4:rokUplatneniVysledku
n7:2009
n4:tvurceVysledku
Hégr, Ondřej
n4:typAkce
n9:WRD
n4:zahajeniAkce
2009-09-02+02:00
n4:zamer
n21:MSM0021630503
s:numberOfPages
4
n19:hasPublisher
NOVPRESS s.r.o.
n20:isbn
978-80-214-3933-7
n12:organizacniJednotka
26220