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Statements

Subject Item
n2:RIV%2F00216305%3A26210%2F09%3APU81578%21RIV10-MSM-26210___
rdf:type
skos:Concept n18:Vysledek
dcterms:description
We report on an alternative approach for the fabrication of metallic nanostructures: a selective growth on silicon substrates patterned by local anodic oxidation using atomic force microscopy. Our method represents a maskless, four-step process which combines a top-down and bottom-up approach. The dimensions of both the oxide lines and metallic elements can be controlled during the technological process. In this paper we demonstrate the preparation of gallium and cobalt structures on silicon substrates but this method can be extended to other combinations of metals and substrates enabling thus the fabrication of ordered nanostructures of various compositions and properties on locally oxidized surfaces. We report on an alternative approach for the fabrication of metallic nanostructures: a selective growth on silicon substrates patterned by local anodic oxidation using atomic force microscopy. Our method represents a maskless, four-step process which combines a top-down and bottom-up approach. The dimensions of both the oxide lines and metallic elements can be controlled during the technological process. In this paper we demonstrate the preparation of gallium and cobalt structures on silicon substrates but this method can be extended to other combinations of metals and substrates enabling thus the fabrication of ordered nanostructures of various compositions and properties on locally oxidized surfaces.
dcterms:title
Selective growth of metallic nanostructures on surfaces patterned by AFM local anodic oxidation Selective growth of metallic nanostructures on surfaces patterned by AFM local anodic oxidation
skos:prefLabel
Selective growth of metallic nanostructures on surfaces patterned by AFM local anodic oxidation Selective growth of metallic nanostructures on surfaces patterned by AFM local anodic oxidation
skos:notation
RIV/00216305:26210/09:PU81578!RIV10-MSM-26210___
n3:aktivita
n7:Z n7:P
n3:aktivity
P(GEFON/06/E001), P(KAN400100701), P(LC06040), Z(MSM0021630508)
n3:cisloPeriodika
10
n3:dodaniDat
n5:2010
n3:domaciTvurceVysledku
n4:2404214 n4:6136168 n4:6804233 n4:9040188 n4:6717209
n3:druhVysledku
n17:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n15:predkladatel
n3:idSjednocenehoVysledku
340657
n3:idVysledku
RIV/00216305:26210/09:PU81578
n3:jazykVysledku
n13:eng
n3:klicovaSlova
Selective growth, Local anodic oxidation, Gallium, Patterning
n3:klicoveSlovo
n6:Selective%20growth n6:Patterning n6:Local%20anodic%20oxidation n6:Gallium
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[966C2C90EE4A]
n3:nazevZdroje
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
n3:obor
n16:BM
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
5
n3:projekt
n12:KAN400100701 n12:LC06040 n12:GEFON%2F06%2FE001
n3:rokUplatneniVysledku
n5:2009
n3:svazekPeriodika
9
n3:tvurceVysledku
Šikola, Tomáš Mach, Jindřich Kolíbal, Miroslav Bartošík, Miroslav Čechal, Jan
n3:zamer
n8:MSM0021630508
s:issn
1533-4880
s:numberOfPages
4
n11:organizacniJednotka
26210