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Statements

Subject Item
n2:RIV%2F00216305%3A26210%2F09%3APU81391%21RIV10-MSM-26210___
rdf:type
skos:Concept n15:Vysledek
dcterms:description
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4. A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.
dcterms:title
Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence
skos:prefLabel
Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence
skos:notation
RIV/00216305:26210/09:PU81391!RIV10-MSM-26210___
n3:aktivita
n8:P
n3:aktivity
P(OC09013)
n3:cisloPeriodika
2
n3:dodaniDat
n12:2010
n3:domaciTvurceVysledku
n5:6620477
n3:druhVysledku
n10:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
323207
n3:idVysledku
RIV/00216305:26210/09:PU81391
n3:jazykVysledku
n13:eng
n3:klicovaSlova
XUV interference litography, capillary-discharge based table-top source
n3:klicoveSlovo
n11:capillary-discharge%20based%20table-top%20source n11:XUV%20interference%20litography
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[178FF4958C46]
n3:nazevZdroje
NANOTECHNOLOGY
n3:obor
n4:BH
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
9
n3:projekt
n17:OC09013
n3:rokUplatneniVysledku
n12:2009
n3:svazekPeriodika
20
n3:tvurceVysledku
Kaiser, Jozef
s:issn
0957-4484
s:numberOfPages
4
n6:organizacniJednotka
26210