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Statements

Subject Item
n2:RIV%2F00216305%3A26210%2F08%3APU74227%21RIV10-MSM-26210___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces. An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.
dcterms:title
Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography
skos:prefLabel
Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography
skos:notation
RIV/00216305:26210/08:PU74227!RIV10-MSM-26210___
n3:aktivita
n7:Z
n3:aktivity
Z(MSM0021630508)
n3:cisloPeriodika
2
n3:dodaniDat
n11:2010
n3:domaciTvurceVysledku
n16:6620477
n3:druhVysledku
n15:J
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
367541
n3:idVysledku
RIV/00216305:26210/08:PU74227
n3:jazykVysledku
n13:eng
n3:klicovaSlova
soft X-ray laser, interferometric litography, metallic micropatterns
n3:klicoveSlovo
n6:soft%20X-ray%20laser n6:metallic%20micropatterns n6:interferometric%20litography
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[2BD567E80D9C]
n3:nazevZdroje
PLASMA SOURCES SCIENCE & TECHNOLOGY
n3:obor
n10:BL
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
12
n3:rokUplatneniVysledku
n11:2008
n3:svazekPeriodika
17
n3:tvurceVysledku
Kaiser, Jozef
n3:zamer
n18:MSM0021630508
s:issn
0963-0252
s:numberOfPages
4
n17:organizacniJednotka
26210