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Statements

Subject Item
n2:RIV%2F00216305%3A26210%2F04%3APU47908%21RIV11-MSM-26210___
rdf:type
skos:Concept n15:Vysledek
dcterms:description
Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
dcterms:title
Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
skos:prefLabel
Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
skos:notation
RIV/00216305:26210/04:PU47908!RIV11-MSM-26210___
n3:aktivita
n17:P n17:V n17:Z
n3:aktivity
P(ME 334), P(PG98377), V, Z(MSM 262100002)
n3:cisloPeriodika
9
n3:dodaniDat
n6:2011
n3:domaciTvurceVysledku
n5:6136168 n5:9597719 n5:8906793 n5:9040188 n5:9952993 n5:8414645 n5:6804233 n5:4176510
n3:druhVysledku
n16:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n9:predkladatel
n3:idSjednocenehoVysledku
555060
n3:idVysledku
RIV/00216305:26210/04:PU47908
n3:jazykVysledku
n7:eng
n3:klicovaSlova
Ga, GaN, deposition, XPS
n3:klicoveSlovo
n4:deposition n4:XPS n4:GaN n4:Ga
n3:kodStatuVydavatele
CZ - Česká republika
n3:kontrolniKodProRIV
[ECCD893EEEE8]
n3:nazevZdroje
Jemná mechanika a optika
n3:obor
n14:BM
n3:pocetDomacichTvurcuVysledku
8
n3:pocetTvurcuVysledku
8
n3:projekt
n8:ME%20334 n8:PG98377
n3:rokUplatneniVysledku
n6:2004
n3:svazekPeriodika
9
n3:tvurceVysledku
Šikola, Tomáš Kostelník, Petr Čechal, Jan Tomanec, Ondřej Spousta, Jiří Bábor, Petr Voborný, Stanislav Mach, Jindřich
n3:zamer
n11:MSM%20262100002
s:issn
0447-6441
s:numberOfPages
5
n18:organizacniJednotka
26210