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Statements

Subject Item
n2:RIV%2F00216275%3A25310%2F14%3A39897425%21RIV15-MSM-25310___
rdf:type
skos:Concept n11:Vysledek
dcterms:description
This chapter comprehensively reviews the possible structural and compositional changes of chalcogenide glasses induced by exposure with suitable radiation (VIS, UV, X-ray, e-beam, ions) which result in their highly selective wet or dry etching and make chalcogenide glasses superior resists for high resolution, gray scale lithography. Their photo- and e-beam resist applications are compared with those for widely used polymer resists. This chapter comprehensively reviews the possible structural and compositional changes of chalcogenide glasses induced by exposure with suitable radiation (VIS, UV, X-ray, e-beam, ions) which result in their highly selective wet or dry etching and make chalcogenide glasses superior resists for high resolution, gray scale lithography. Their photo- and e-beam resist applications are compared with those for widely used polymer resists.
dcterms:title
Chalcogenide glass resists for lithography Chalcogenide glass resists for lithography
skos:prefLabel
Chalcogenide glass resists for lithography Chalcogenide glass resists for lithography
skos:notation
RIV/00216275:25310/14:39897425!RIV15-MSM-25310___
n3:aktivita
n16:P n16:I
n3:aktivity
I, P(GAP204/11/0832)
n3:dodaniDat
n12:2015
n3:domaciTvurceVysledku
n15:1620290
n3:druhVysledku
n18:C
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n10:predkladatel
n3:idSjednocenehoVysledku
6754
n3:idVysledku
RIV/00216275:25310/14:39897425
n3:jazykVysledku
n19:eng
n3:klicovaSlova
nano lithography; resists; chalcogenide glass
n3:klicoveSlovo
n4:resists n4:chalcogenide%20glass n4:nano%20lithography
n3:kontrolniKodProRIV
[E2443880A632]
n3:mistoVydani
Cambridge
n3:nazevZdroje
Chalcogenide Glasses: Preparation, Properties and Applications
n3:obor
n7:JA
n3:pocetDomacichTvurcuVysledku
1
n3:pocetStranKnihy
716
n3:pocetTvurcuVysledku
3
n3:projekt
n20:GAP204%2F11%2F0832
n3:rokUplatneniVysledku
n12:2014
n3:tvurceVysledku
Vlček, Miroslav Kovalskiy, Andriy Jain, Himanshu
s:numberOfPages
34
n17:hasPublisher
Woodhead Publishing
n13:isbn
978-0-85709-345-5
n8:organizacniJednotka
25310