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Statements

Subject Item
n2:RIV%2F00216224%3A14740%2F14%3A00079905%21RIV15-MSM-14740___
rdf:type
skos:Concept n15:Vysledek
rdfs:seeAlso
http://onlinelibrary.wiley.com/doi/10.1002/ppap.201300177/epdf
dcterms:description
The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280nm thick film exhibits only 20% thickness loss after 48h immersion in water and still contains about 5at% of the NHx environment. The present investigation of cyclopropylamine (CPA) plasma polymerization in pulsed and continuous wave radio frequency (RF) discharges leads to the proposition of conditions at which amine-rich films exhibit a good stability in contact with water. The analyses reveal complex structure of CPA plasma polymers containing hydrocarbon chains, primary and secondary amines, nitriles and possibly imines. The decomposition of the monomer in plasma is progressing with the composite parameter W/F (RF power over monomer flow rate) but, in pulsed discharges, it is possible to deposit the films with N/C ratio above 0.24 using higher monomer flow rate. At the optimized monomer flow rate the 280nm thick film exhibits only 20% thickness loss after 48h immersion in water and still contains about 5at% of the NHx environment.
dcterms:title
Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water
skos:prefLabel
Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water Optimization of Cyclopropylamine Plasma Polymerization toward Enhanced Layer Stability in Contact with Water
skos:notation
RIV/00216224:14740/14:00079905!RIV15-MSM-14740___
n4:aktivita
n13:P
n4:aktivity
P(ED1.1.00/02.0068), P(EE2.3.30.0009)
n4:cisloPeriodika
6
n4:dodaniDat
n14:2015
n4:domaciTvurceVysledku
n5:9455817 n5:5870879 n5:6935281 n5:8326827 n5:4205448 Manakhov, Anton
n4:druhVysledku
n12:J
n4:duvernostUdaju
n18:S
n4:entitaPredkladatele
n20:predkladatel
n4:idSjednocenehoVysledku
34951
n4:idVysledku
RIV/00216224:14740/14:00079905
n4:jazykVysledku
n7:eng
n4:klicovaSlova
amine coatings; cyclopropylamine; ESCA; XPS; FT-IR; pulsed discharges
n4:klicoveSlovo
n8:cyclopropylamine n8:FT-IR n8:amine%20coatings n8:ESCA n8:XPS n8:pulsed%20discharges
n4:kodStatuVydavatele
DE - Spolková republika Německo
n4:kontrolniKodProRIV
[074D78BBC6D9]
n4:nazevZdroje
Plasma Processes and Polymers
n4:obor
n17:BM
n4:pocetDomacichTvurcuVysledku
6
n4:pocetTvurcuVysledku
8
n4:projekt
n11:ED1.1.00%2F02.0068 n11:EE2.3.30.0009
n4:rokUplatneniVysledku
n14:2014
n4:svazekPeriodika
11
n4:tvurceVysledku
Polčák, Josef Nečas, David Zajíčková, Lenka Bittnerová, Štěpánka Hnilica, Jaroslav Čechal, Jan Manakhov, Anton Eliáš, Marek
n4:wos
000337626000003
s:issn
1612-8850
s:numberOfPages
13
n16:doi
10.1002/ppap.201300177
n19:organizacniJednotka
14740