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Statements

Subject Item
n2:RIV%2F00216224%3A14740%2F14%3A00073337%21RIV15-MSM-14740___
rdf:type
n8:Vysledek skos:Concept
rdfs:seeAlso
http://ac.els-cdn.com/S0040609013021007/1-s2.0-S0040609013021007-main.pdf?_tid=83eecb72-d868-11e4-9e7b-00000aab0f6c&acdnat=1427890593_5f13d02ce4a284783378d30a332962c6
dcterms:description
Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V. Standard variable-angle spectroscopic ellipsometry, mapping spectroscopic ellipsometry with microspot and imaging spectroscopic reflectometry are applied to optical characterisation of a thin SiOxCyHz film considerably non-uniform in thickness and which is also suspected of non-uniformity also in the optical constants. It is shown that using the combination of these three optical methods, enables us to determine the spectral dependencies of the optical constants of the film together with parameters characterising the shape of thickness non-uniformity and fine map of local thickness. The mapping spectroscopic ellipsometry with microspot enables deciding whether the film is non-uniform in optical constants. For the thin film studied it is found that the non-uniformity in optical constants is under experimental accuracy. The consistency of results obtained using individual techniques is checked and the advantages and disadvantages of the techniques are discussed. (C) 2013 Elsevier B.V.
dcterms:title
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry
skos:prefLabel
Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry Assessment of non-uniform thin films using spectroscopic ellipsometry and imaging spectroscopic reflectometry
skos:notation
RIV/00216224:14740/14:00073337!RIV15-MSM-14740___
n4:aktivita
n5:P n5:I
n4:aktivity
I, P(ED1.1.00/02.0068), P(ED2.1.00/03.0086), P(TA02010784)
n4:cisloPeriodika
november
n4:dodaniDat
n11:2015
n4:domaciTvurceVysledku
n7:4205448 n7:1986074 n7:9412921 n7:8326827 n7:5870879 n7:2026384
n4:druhVysledku
n17:J
n4:duvernostUdaju
n9:S
n4:entitaPredkladatele
n15:predkladatel
n4:idSjednocenehoVysledku
4284
n4:idVysledku
RIV/00216224:14740/14:00073337
n4:jazykVysledku
n18:eng
n4:klicovaSlova
Variable-angle spectroscopic ellipsometry; Mapping spectroscopic ellipsometry; Imaging spectroscopic reflectometry; Non-uniform thin films
n4:klicoveSlovo
n14:Mapping%20spectroscopic%20ellipsometry n14:Non-uniform%20thin%20films n14:Imaging%20spectroscopic%20reflectometry n14:Variable-angle%20spectroscopic%20ellipsometry
n4:kodStatuVydavatele
CH - Švýcarská konfederace
n4:kontrolniKodProRIV
[31F5FE32EBB2]
n4:nazevZdroje
Thin Solid Films
n4:obor
n10:BM
n4:pocetDomacichTvurcuVysledku
6
n4:pocetTvurcuVysledku
10
n4:projekt
n12:TA02010784 n12:ED1.1.00%2F02.0068 n12:ED2.1.00%2F03.0086
n4:rokUplatneniVysledku
n11:2014
n4:svazekPeriodika
571
n4:tvurceVysledku
Eliáš, Marek Čudek, Vladimír Ohlídal, Miloslav Zajíčková, Lenka Vizďa, František Vodák, Jiří Nečas, David Sládková, Lucia Ohlídal, Ivan Franta, Daniel
n4:wos
000346055200044
s:issn
0040-6090
s:numberOfPages
6
n16:doi
10.1016/j.tsf.2013.12.036
n19:organizacniJednotka
14740