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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F10%3A00045789%21RIV11-GA0-14310___
rdf:type
n12:Vysledek skos:Concept
dcterms:description
Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process. Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. Modelling of hybrid PVD-PECVd process.
dcterms:title
Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering. Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
skos:prefLabel
Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering. Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering.
skos:notation
RIV/00216224:14310/10:00045789!RIV11-GA0-14310___
n3:aktivita
n6:Z n6:P
n3:aktivity
P(GD104/09/H080), P(GP202/08/P038), Z(MSM0021622411)
n3:dodaniDat
n15:2011
n3:domaciTvurceVysledku
n9:7247664 n9:3589730
n3:druhVysledku
n13:O
n3:duvernostUdaju
n17:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
248550
n3:idVysledku
RIV/00216224:14310/10:00045789
n3:jazykVysledku
n18:eng
n3:klicovaSlova
magnetron sputtering; hysteresis; hybrid PVD-PECVD process
n3:klicoveSlovo
n16:magnetron%20sputtering n16:hybrid%20PVD-PECVD%20process n16:hysteresis
n3:kontrolniKodProRIV
[2BE4EE770D5C]
n3:obor
n8:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:projekt
n14:GP202%2F08%2FP038 n14:GD104%2F09%2FH080
n3:rokUplatneniVysledku
n15:2010
n3:tvurceVysledku
Vašina, Petr Schmidtová, Tereza
n3:zamer
n7:MSM0021622411
n10:organizacniJednotka
14310