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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F10%3A00044824%21RIV11-GA0-14310___
rdf:type
n5:Vysledek skos:Concept
dcterms:description
A promising method for monitoring of reactive magnetron sputtering, based on the measurement of amplitudes of higher harmonic frequencies of discharge voltages, is proposed. The measurement of the amplitudes can be performed either by an uncompensated probe in the plasma or on the cable between the RF generator and the sputtered target. The sensitivity of the proposed method is significantly better than measurement of other electrical quantities conventionally used for process control. Physical reasons for the change of amplitudes of higher harmonic frequencies during the mode transition were found. The paper shows that the observed changes in amplitudes of higher harmonics by the transition are not caused either by the pressure change, or by the changes in the composition of the gas in the reactor volume. It was found that the amplitudes of higher harmonics reflect primarily the state of the magnetron target poisoning. A promising method for monitoring of reactive magnetron sputtering, based on the measurement of amplitudes of higher harmonic frequencies of discharge voltages, is proposed. The measurement of the amplitudes can be performed either by an uncompensated probe in the plasma or on the cable between the RF generator and the sputtered target. The sensitivity of the proposed method is significantly better than measurement of other electrical quantities conventionally used for process control. Physical reasons for the change of amplitudes of higher harmonic frequencies during the mode transition were found. The paper shows that the observed changes in amplitudes of higher harmonics by the transition are not caused either by the pressure change, or by the changes in the composition of the gas in the reactor volume. It was found that the amplitudes of higher harmonics reflect primarily the state of the magnetron target poisoning.
dcterms:title
Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages
skos:prefLabel
Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages
skos:notation
RIV/00216224:14310/10:00044824!RIV11-GA0-14310___
n3:aktivita
n13:P n13:Z
n3:aktivity
P(GP202/08/P038), Z(MSM0021622411)
n3:cisloPeriodika
5
n3:dodaniDat
n16:2011
n3:domaciTvurceVysledku
n12:3589730 n12:6296556
n3:druhVysledku
n10:J
n3:duvernostUdaju
n15:S
n3:entitaPredkladatele
n4:predkladatel
n3:idSjednocenehoVysledku
272482
n3:idVysledku
RIV/00216224:14310/10:00044824
n3:jazykVysledku
n11:eng
n3:klicovaSlova
plasma; higher harmonic frequencies; reactive magnetron sputtering
n3:klicoveSlovo
n9:plasma n9:higher%20harmonic%20frequencies n9:reactive%20magnetron%20sputtering
n3:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n3:kontrolniKodProRIV
[C7625EC9A8F4]
n3:nazevZdroje
Plasma Sources Sci. Technol.
n3:obor
n17:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:projekt
n8:GP202%2F08%2FP038
n3:rokUplatneniVysledku
n16:2010
n3:svazekPeriodika
19
n3:tvurceVysledku
Dvořák, Pavel Vašina, Petr
n3:wos
000282096600016
n3:zamer
n19:MSM0021622411
s:issn
0963-0252
s:numberOfPages
8
n18:organizacniJednotka
14310