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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F09%3A00029733%21RIV10-MSM-14310___
rdf:type
n6:Vysledek skos:Concept
dcterms:description
Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection. Using the high resolution diffractometer we have successfully measured photoresist layers more than 1 um thick by x-rays. The thicknesses obtained by x-ray reflectivity correspond well to the ones obtained by optical reflection.
dcterms:title
Towards limits of x-ray specular reflectivity Towards limits of x-ray specular reflectivity
skos:prefLabel
Towards limits of x-ray specular reflectivity Towards limits of x-ray specular reflectivity
skos:notation
RIV/00216224:14310/09:00029733!RIV10-MSM-14310___
n3:aktivita
n8:P n8:Z
n3:aktivity
P(GA202/09/1013), Z(MSM0021622410)
n3:cisloPeriodika
2a
n3:dodaniDat
n13:2010
n3:domaciTvurceVysledku
n11:1852558 n11:2933640
n3:druhVysledku
n5:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n17:predkladatel
n3:idSjednocenehoVysledku
346569
n3:idVysledku
RIV/00216224:14310/09:00029733
n3:jazykVysledku
n14:eng
n3:klicovaSlova
x-ray reflectivity; fourier transform; photoresist
n3:klicoveSlovo
n4:x-ray%20reflectivity n4:fourier%20transform n4:photoresist
n3:kodStatuVydavatele
CZ - Česká republika
n3:kontrolniKodProRIV
[E7A479A94C5C]
n3:nazevZdroje
Materials Structure in Chemistry, Biology, Physics and Technology
n3:obor
n15:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:projekt
n16:GA202%2F09%2F1013
n3:rokUplatneniVysledku
n13:2009
n3:svazekPeriodika
16
n3:tvurceVysledku
Meduňa, Mojmír Jíša, Jan
n3:zamer
n12:MSM0021622410
s:issn
1211-5894
s:numberOfPages
2
n18:organizacniJednotka
14310