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Statements

Subject Item

n2:RIV%2F00216224%3A14310%2F08%3A00027765%21RIV10-MSM-14310___

rdf:type

skos:Concept n14:Vysledek

dcterms:description

We have investigated SiGe/Si and SiGe/Ge multilayers annealed in-situ at temperatures in the range 680-800 C by x-ray diffraction. We have investigated SiGe/Si and SiGe/Ge multilayers annealed in-situ at temperatures in the range 680-800 C by x-ray diffraction.

dcterms:title

Utilization of synchrotron radiation for in-situ diffusion studies Utilization of synchrotron radiation for in-situ diffusion studies

skos:prefLabel

Utilization of synchrotron radiation for in-situ diffusion studies Utilization of synchrotron radiation for in-situ diffusion studies

skos:notation

RIV/00216224:14310/08:00027765!RIV10-MSM-14310___

n3:aktivita

n10:Z

n3:aktivity

Z(MSM0021622410)

n3:dodaniDat

n4:2010

n3:domaciTvurceVysledku

n12:7105711 n12:1852558

n3:druhVysledku

n13:O

n3:duvernostUdaju

n17:S

n3:entitaPredkladatele

n9:predkladatel

n3:idSjednocenehoVysledku

401999

n3:idVysledku

RIV/00216224:14310/08:00027765

n3:jazykVysledku

n15:eng

n3:klicovaSlova

x-ray reflectivity; diffraction interdiffusion

n3:klicoveSlovo

n16:x-ray%20reflectivity n16:diffraction%20interdiffusion

n3:kontrolniKodProRIV

[5B406452E80D]

n3:obor

n5:BM

n3:pocetDomacichTvurcuVysledku

2

n3:pocetTvurcuVysledku

5

n3:rokUplatneniVysledku

n4:2008

n3:tvurceVysledku

Mussler, Gregor Meduňa, Mojmír Caha, Ondřej Grützmacher, Detlev Bauer, Günther

n3:zamer

n8:MSM0021622410

n11:organizacniJednotka

14310