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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F06%3A00016723%21RIV10-MSM-14310___
rdf:type
skos:Concept n16:Vysledek
dcterms:description
In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp.
dcterms:title
Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization
skos:prefLabel
Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization
skos:notation
RIV/00216224:14310/06:00016723!RIV10-MSM-14310___
n4:aktivita
n10:Z
n4:aktivity
Z(MSM0021622411)
n4:cisloPeriodika
1
n4:dodaniDat
n15:2010
n4:domaciTvurceVysledku
n17:5823803
n4:druhVysledku
n13:J
n4:duvernostUdaju
n7:S
n4:entitaPredkladatele
n5:predkladatel
n4:idSjednocenehoVysledku
503802
n4:idVysledku
RIV/00216224:14310/06:00016723
n4:jazykVysledku
n18:eng
n4:klicovaSlova
Thermoionic vacuum arc (TVA); tungsten; thin film; characterization
n4:klicoveSlovo
n14:Thermoionic%20vacuum%20arc%20%28TVA%29 n14:tungsten n14:characterization n14:thin%20film
n4:kodStatuVydavatele
RO - Rumunsko
n4:kontrolniKodProRIV
[50B42E0F29E1]
n4:nazevZdroje
Journal of Optoelectronics and Advanced Materials
n4:obor
n12:BL
n4:pocetDomacichTvurcuVysledku
1
n4:pocetTvurcuVysledku
5
n4:rokUplatneniVysledku
n15:2006
n4:svazekPeriodika
8
n4:tvurceVysledku
Musa, G. Lungu, C. P. Ciupina, V. Vladoiu, R. Buršíková, Vilma
n4:zamer
n6:MSM0021622411
s:issn
1454-4164
s:numberOfPages
3
n11:organizacniJednotka
14310