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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F06%3A00015901%21RIV10-MSM-14310___
rdf:type
n5:Vysledek skos:Concept
dcterms:description
Carbon nanotube properties provoked interest in many fields of application but there is still need to develop deposition techniques, which enable precise control of nanotubes positioning, alignment and properties. Chemical vapor deposition (CVD) methods and lately also plasma enhanced CVD (PECVD) are most promising to reach this goal. In the first part of the article we will briefly describe carbon nanotubes structure and properties and review the necessary conditions and possible control mechanisms used in PECVD deposition method. In the second part, examples of two deposition techniques, one working at a low pressure and one at an atmospheric pressure, will be described and reached results analyzed. Carbon nanotube properties provoked interest in many fields of application but there is still need to develop deposition techniques, which enable precise control of nanotubes positioning, alignment and properties. Chemical vapor deposition (CVD) methods and lately also plasma enhanced CVD (PECVD) are most promising to reach this goal. In the first part of the article we will briefly describe carbon nanotubes structure and properties and review the necessary conditions and possible control mechanisms used in PECVD deposition method. In the second part, examples of two deposition techniques, one working at a low pressure and one at an atmospheric pressure, will be described and reached results analyzed.
dcterms:title
Carbon nanotubes deposition by plasma enhanced chemical vapor deposition Carbon nanotubes deposition by plasma enhanced chemical vapor deposition
skos:prefLabel
Carbon nanotubes deposition by plasma enhanced chemical vapor deposition Carbon nanotubes deposition by plasma enhanced chemical vapor deposition
skos:notation
RIV/00216224:14310/06:00015901!RIV10-MSM-14310___
n3:aktivita
n9:P n9:Z
n3:aktivity
P(GA202/05/0607), Z(AV0Z20410507), Z(AV0Z20650511), Z(MSM0021622411)
n3:dodaniDat
n11:2010
n3:domaciTvurceVysledku
n7:8325677 n7:1537539 n7:8588627 n7:8326827 n7:4205448
n3:druhVysledku
n22:D
n3:duvernostUdaju
n14:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
467755
n3:idVysledku
RIV/00216224:14310/06:00015901
n3:jazykVysledku
n21:eng
n3:klicovaSlova
carbon nanotubes; plasma enhanced chemical vapor depostion; catalyst; electron microscopy
n3:klicoveSlovo
n13:carbon%20nanotubes n13:plasma%20enhanced%20chemical%20vapor%20depostion n13:catalyst n13:electron%20microscopy
n3:kontrolniKodProRIV
[9BC7DBE431CB]
n3:mistoKonaniAkce
Brno University of technology
n3:mistoVydani
Brno
n3:nazevZdroje
Proceedings Electronic devices and systems 2006 IMAPS CS International Conference
n3:obor
n17:BL
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
8
n3:projekt
n12:GA202%2F05%2F0607
n3:rokUplatneniVysledku
n11:2006
n3:tvurceVysledku
Eliáš, Marek Kudrle, Vít Matějková, Jiřina Studýnková, Zuzana Rek, Antonín Jašek, Ondřej Zajíčková, Lenka Buršík, Jiří
n3:typAkce
n4:EUR
n3:zahajeniAkce
2006-09-14+02:00
n3:zamer
n10:AV0Z20650511 n10:AV0Z20410507 n10:MSM0021622411
s:numberOfPages
6
n18:hasPublisher
Vysoké učení technické v Brně
n20:isbn
80-214-3246-2
n15:organizacniJednotka
14310