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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F05%3A00025502%21RIV10-MSM-14310___
rdf:type
skos:Concept n12:Vysledek
dcterms:description
In this contribution we present a study of the role of secondary electrons in low pressure RF discharge via computer simulation. We have used particle simulation Particle In Cell Monte Carlo (PIC-MC) method. We have shown that the secondary electron emission coefficient (SEC) of electrodes affects plasma density. The change of the SEC from 0.1 to 0.2 induces an increase of plasma density up to 30%. We determined that about 30 % of all electrons in plasma are secondary electrons and electrons created in ionization collisions of secondary electrons. More than half of all ions in plasma are ions, created in ionization collisions of secondary electrons. We have calculated many further characteristics of secondary particles. In this contribution we present a study of the role of secondary electrons in low pressure RF discharge via computer simulation. We have used particle simulation Particle In Cell Monte Carlo (PIC-MC) method. We have shown that the secondary electron emission coefficient (SEC) of electrodes affects plasma density. The change of the SEC from 0.1 to 0.2 induces an increase of plasma density up to 30%. We determined that about 30 % of all electrons in plasma are secondary electrons and electrons created in ionization collisions of secondary electrons. More than half of all ions in plasma are ions, created in ionization collisions of secondary electrons. We have calculated many further characteristics of secondary particles.
dcterms:title
The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation
skos:prefLabel
The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation
skos:notation
RIV/00216224:14310/05:00025502!RIV10-MSM-14310___
n3:aktivita
n16:Z
n3:aktivity
Z(MSM0021622411)
n3:dodaniDat
n15:2010
n3:domaciTvurceVysledku
n8:1034871 n8:3319318
n3:druhVysledku
n6:D
n3:duvernostUdaju
n18:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
541435
n3:idVysledku
RIV/00216224:14310/05:00025502
n3:jazykVysledku
n5:eng
n3:klicovaSlova
secondary electrons; computer simulation
n3:klicoveSlovo
n13:computer%20simulation n13:secondary%20electrons
n3:kontrolniKodProRIV
[05B22212D1EC]
n3:mistoKonaniAkce
Podbanske
n3:mistoVydani
Podbanske, Slovakia
n3:nazevZdroje
SAPP XV
n3:obor
n9:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:rokUplatneniVysledku
n15:2005
n3:tvurceVysledku
Brzobohatý, Oto Trunec, David
n3:typAkce
n11:WRD
n3:zahajeniAkce
2005-01-01+01:00
n3:zamer
n21:MSM0021622411
s:numberOfPages
2
n17:hasPublisher
Karol Hensel
n14:isbn
80-223-2018-8
n20:organizacniJednotka
14310