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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F05%3A00013025%21RIV10-MSM-14310___
rdf:type
n9:Vysledek skos:Concept
dcterms:description
In this paper the mechanical stresses taking place in diamond like thin films prepared by the plasma enhanced chemical vapor deposition onto silicon single crystal substrates are studied. For determination of the stress values the Stoney's formula is used. The values of the film thicknesses are determined using the combined method of variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. The values of the curvature radii of the deformed silicon substrates in consequence of the film stresses are evaluated using interferometric method based on two-beam interferometry and chromatic aberration method. The dependence of the mechanical stress inside these films on their thickness values is determined. It is found that this dependence can be approximate by the straight-line. The results achieved for the mechanical stresses obtained by both the optical methods, i.e. by the interferometric and chromatic aberration method, are compared. In this paper the mechanical stresses taking place in diamond like thin films prepared by the plasma enhanced chemical vapor deposition onto silicon single crystal substrates are studied. For determination of the stress values the Stoney's formula is used. The values of the film thicknesses are determined using the combined method of variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. The values of the curvature radii of the deformed silicon substrates in consequence of the film stresses are evaluated using interferometric method based on two-beam interferometry and chromatic aberration method. The dependence of the mechanical stress inside these films on their thickness values is determined. It is found that this dependence can be approximate by the straight-line. The results achieved for the mechanical stresses obtained by both the optical methods, i.e. by the interferometric and chromatic aberration method, are compared.
dcterms:title
Optical measurement of mechanical stresses in diamond-like carbon films Optical measurement of mechanical stresses in diamond-like carbon films
skos:prefLabel
Optical measurement of mechanical stresses in diamond-like carbon films Optical measurement of mechanical stresses in diamond-like carbon films
skos:notation
RIV/00216224:14310/05:00013025!RIV10-MSM-14310___
n3:aktivita
n14:Z n14:P
n3:aktivity
P(GA101/04/2131), Z(MSM 143100003)
n3:dodaniDat
n7:2010
n3:domaciTvurceVysledku
n6:2794187 n6:2026384 n6:2260387 n6:5823803 n6:9412921
n3:druhVysledku
n18:D
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
534709
n3:idVysledku
RIV/00216224:14310/05:00013025
n3:jazykVysledku
n17:eng
n3:klicovaSlova
DLC films; mechanical stress; two-beam interferometry; chromatic aberration method
n3:klicoveSlovo
n12:mechanical%20stress n12:DLC%20films n12:chromatic%20aberration%20method n12:two-beam%20interferometry
n3:kontrolniKodProRIV
[9C9B87619717]
n3:mistoKonaniAkce
February 14-18, 2005, Merida, Yucatan, Mexico
n3:mistoVydani
Bellingham, Washington, USA
n3:nazevZdroje
8-th International Symposium on Laser Metrology
n3:obor
n22:BM
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
6
n3:projekt
n4:GA101%2F04%2F2131
n3:rokUplatneniVysledku
n7:2005
n3:tvurceVysledku
Čudek, Vladimír Klapetek, Petr Ohlídal, Ivan Buršíková, Vilma Franta, Daniel Ohlídal, Miloslav
n3:typAkce
n15:WRD
n3:zahajeniAkce
2005-01-01+01:00
n3:zamer
n20:MSM%20143100003
s:numberOfPages
12
n21:hasPublisher
SPIE - The International Society for Optical Engineering
n5:isbn
0-8194-5757-4
n10:organizacniJednotka
14310