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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F05%3A00012968%21RIV10-MSM-14310___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He bufer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported. A high-power pulsed-magnetron discharge (several kW/cm2)is described. It operates at pulse duration of the order of few ľs, signicantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He bufer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few ľs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10A/cm2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion ux to the substrate. Preliminary result on Cu deposit in trenches is reported.
dcterms:title
Reduction of transient regime in fast preionized high power pulsed magnetron discharge Reduction of transient regime in fast preionized high power pulsed magnetron discharge
skos:prefLabel
Reduction of transient regime in fast preionized high power pulsed magnetron discharge Reduction of transient regime in fast preionized high power pulsed magnetron discharge
skos:notation
RIV/00216224:14310/05:00012968!RIV10-MSM-14310___
n3:aktivita
n15:Z n15:P
n3:aktivity
P(GD202/03/H162), Z(MSM0021622411)
n3:cisloPeriodika
3
n3:dodaniDat
n6:2010
n3:domaciTvurceVysledku
n12:8936153 n12:3589730
n3:druhVysledku
n19:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
540405
n3:idVysledku
RIV/00216224:14310/05:00012968
n3:jazykVysledku
n7:eng
n3:klicovaSlova
pulsed magnetron; sputtering; preionization
n3:klicoveSlovo
n10:sputtering n10:pulsed%20magnetron n10:preionization
n3:kodStatuVydavatele
FR - Francouzská republika
n3:kontrolniKodProRIV
[D5F7612FB381]
n3:nazevZdroje
Europhysics Letters
n3:obor
n11:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
7
n3:projekt
n18:GD202%2F03%2FH162
n3:rokUplatneniVysledku
n6:2005
n3:svazekPeriodika
72
n3:tvurceVysledku
Meško, Marcel Vašina, Petr Boisse-Laporte, Caroline Bretagne, Jean Ganciu, Mihai de Poucques, Ludovic Touzeau, Michel
n3:zamer
n9:MSM0021622411
s:issn
0295-5075
s:numberOfPages
5
n17:organizacniJednotka
14310