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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F05%3A00012906%21RIV10-MSM-14310___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges. By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness, electric arc development is avoided. To improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionisation of the sputtered vapour, we developed a new ionised physical vapour deposition (IPVD) method based on preionised Pulsed magnetron discharges. By superposition of continuous, microwave or RF discharge, with a fast pulsed abnormal discharge, target current density is extended to very high values during short pulses. Efficient vapour ionisation is obtained and due to the current pulse shortness, electric arc development is avoided.
dcterms:title
Preionised pulsed magnetron discharges for ionised physical vapour deposition Preionised pulsed magnetron discharges for ionised physical vapour deposition
skos:prefLabel
Preionised pulsed magnetron discharges for ionised physical vapour deposition Preionised pulsed magnetron discharges for ionised physical vapour deposition
skos:notation
RIV/00216224:14310/05:00012906!RIV10-MSM-14310___
n3:aktivita
n4:P n4:Z
n3:aktivity
P(GD202/03/H162), Z(MSM0021622411)
n3:cisloPeriodika
5
n3:dodaniDat
n9:2010
n3:domaciTvurceVysledku
n11:8936153 n11:3589730
n3:druhVysledku
n8:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
538097
n3:idVysledku
RIV/00216224:14310/05:00012906
n3:jazykVysledku
n7:eng
n3:klicovaSlova
pulsed magnetron; preionization; transport processes
n3:klicoveSlovo
n17:pulsed%20magnetron n17:preionization n17:transport%20processes
n3:kodStatuVydavatele
RO - Rumunsko
n3:kontrolniKodProRIV
[E76B88A1BD56]
n3:nazevZdroje
Journal of Optoelectronics and Advanced Materials
n3:obor
n12:BL
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
11
n3:projekt
n18:GD202%2F03%2FH162
n3:rokUplatneniVysledku
n9:2005
n3:svazekPeriodika
7
n3:tvurceVysledku
Hecq, Michel Dauchot, Jean-Pierre Bretagne, Jean Touzeau, Michel Vašina, Petr Ganciu, Mihai Paint, Yoann Imbert, Jean-Christophe Konstantinidis, Stephanos Meško, Marcel de Poucques, Ludovic
n3:zamer
n19:MSM0021622411
s:issn
1454-4164
s:numberOfPages
3
n15:organizacniJednotka
14310