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Statements

Subject Item
n2:RIV%2F00216224%3A14310%2F00%3A00002787%21RIV09-MSM-14310___
rdf:type
n7:Vysledek skos:Concept
dcterms:description
The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy. The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy. The possibility to use of special configuration of the torch discharge burning in mixture of argon and n-hexan for deposition of CH thin films on Al and Cu substrate is reported. Basic parameters of the diacharge is studied using emission spectroscopy.
dcterms:title
The plasma diagnostics of the RF torch discharge plasma chemical system The plasma diagnostics of the RF torch discharge plasma chemical system The plasma diagnostics of the RF torch discharge plasma chemical system
skos:prefLabel
The plasma diagnostics of the RF torch discharge plasma chemical system The plasma diagnostics of the RF torch discharge plasma chemical system The plasma diagnostics of the RF torch discharge plasma chemical system
skos:notation
RIV/00216224:14310/00:00002787!RIV09-MSM-14310___
n3:aktivita
n6:Z n6:P
n3:aktivity
P(GA202/00/1592), Z(MSM 143100003)
n3:dodaniDat
n22:2009
n3:domaciTvurceVysledku
n5:3664031 n5:2022931 n5:8370745 n5:4387635 n5:3460444
n3:druhVysledku
n20:D
n3:duvernostUdaju
n8:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
721677
n3:idVysledku
RIV/00216224:14310/00:00002787
n3:jazykVysledku
n13:eng
n3:klicovaSlova
Torch discharge plasma; surface treatmnet; plasma diagnostics
n3:klicoveSlovo
n11:Torch%20discharge%20plasma n11:surface%20treatmnet n11:plasma%20diagnostics
n3:kontrolniKodProRIV
[41F3ADBFDC51]
n3:mistoKonaniAkce
7. - 14. September 2000, Greifswald, Germany
n3:mistoVydani
Greifswald
n3:nazevZdroje
International Symposium, on High Pressure Low Temperature Plasma Chemistry- HAKONE VII, Greifswald-Germany 2000, Contributed Papers
n3:obor
n10:BL
n3:pocetDomacichTvurcuVysledku
5
n3:pocetTvurcuVysledku
7
n3:projekt
n18:GA202%2F00%2F1592
n3:rokUplatneniVysledku
n22:2000
n3:tvurceVysledku
Behnke, J. F. Brablec, Antonín Klíma, Miloš Vaculík, Robert Slavíček, Pavel Šícha, Miloš Kapička, Vratislav
n3:typAkce
n15:CST
n3:zahajeniAkce
2000-01-01+01:00
n3:zamer
n21:MSM%20143100003
s:numberOfPages
4
n4:hasPublisher
University E.- M. Arndt Greifswald
n16:isbn
3-00-006603-9
n17:organizacniJednotka
14310