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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F14%3A10288854%21RIV15-MSM-11320___
rdf:type
n11:Vysledek skos:Concept
rdfs:seeAlso
http://dx.doi.org/10.1063/1.4868490
dcterms:description
AlN/Fe/AlN/Cu nanostructures with ultrathin Fe grown by sputtering on Si substrates are evaluated as probes for magnetooptical (MO) mapping of weak currents. They are considered for a laser wavelength of lambda = 410 nm (3.02 eV) and operate at oblique light incidence angles, phi((0)), to enable detection of both in-plane and out-of-plane magnetization. Their performance is evaluated in terms of MO reflected wave electric field amplitudes. The maximal MO amplitudes in AlN/Fe/AlN/Cu are achieved by a proper choice of layer thicknesses. The nanostructures were characterized by MO polar Kerr effect at phi((0)) approximate to 5 degrees and longitudinal Kerr effect spectra (phi((0)) = 45 degrees) at photon energies between 1 and 5 eV. The nominal profiles were refined using a model-based analysis of the spectra. Closed form analytical expressions are provided, which are useful in the search for maximal MO amplitudes. (C) 2014 AIP Publishing LLC. AlN/Fe/AlN/Cu nanostructures with ultrathin Fe grown by sputtering on Si substrates are evaluated as probes for magnetooptical (MO) mapping of weak currents. They are considered for a laser wavelength of lambda = 410 nm (3.02 eV) and operate at oblique light incidence angles, phi((0)), to enable detection of both in-plane and out-of-plane magnetization. Their performance is evaluated in terms of MO reflected wave electric field amplitudes. The maximal MO amplitudes in AlN/Fe/AlN/Cu are achieved by a proper choice of layer thicknesses. The nanostructures were characterized by MO polar Kerr effect at phi((0)) approximate to 5 degrees and longitudinal Kerr effect spectra (phi((0)) = 45 degrees) at photon energies between 1 and 5 eV. The nominal profiles were refined using a model-based analysis of the spectra. Closed form analytical expressions are provided, which are useful in the search for maximal MO amplitudes. (C) 2014 AIP Publishing LLC.
dcterms:title
AlN/Fe/AlN nanostructures for magnetooptic magnetometry AlN/Fe/AlN nanostructures for magnetooptic magnetometry
skos:prefLabel
AlN/Fe/AlN nanostructures for magnetooptic magnetometry AlN/Fe/AlN nanostructures for magnetooptic magnetometry
skos:notation
RIV/00216208:11320/14:10288854!RIV15-MSM-11320___
n3:aktivita
n15:P n15:I
n3:aktivity
I, P(GAP205/11/2137)
n3:cisloPeriodika
17
n3:dodaniDat
n10:2015
n3:domaciTvurceVysledku
n7:7388578 n7:2586614
n3:druhVysledku
n16:J
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
2220
n3:idVysledku
RIV/00216208:11320/14:10288854
n3:jazykVysledku
n9:eng
n3:klicovaSlova
constants; fe; metals; films; optical-properties
n3:klicoveSlovo
n6:optical-properties n6:films n6:fe n6:constants n6:metals
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[32EFE805BE00]
n3:nazevZdroje
Journal of Applied Physics
n3:obor
n4:BH
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
7
n3:projekt
n18:GAP205%2F11%2F2137
n3:rokUplatneniVysledku
n10:2014
n3:svazekPeriodika
115
n3:tvurceVysledku
Višňovský, Štefan Hrabovsky, D. Pistora, J. Jakubisová, Eva Celinski, Z. Siroky, P. Harward, I.
n3:wos
000335643700181
s:issn
0021-8979
s:numberOfPages
3
n19:doi
10.1063/1.4868490
n14:organizacniJednotka
11320