This HTML5 document contains 50 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n15http://localhost/temp/predkladatel/
n5http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n17http://linked.opendata.cz/resource/domain/vavai/subjekt/
n7http://linked.opendata.cz/ontology/domain/vavai/
shttp://schema.org/
n4http://linked.opendata.cz/ontology/domain/vavai/riv/
skoshttp://www.w3.org/2004/02/skos/core#
n20http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F00216208%3A11320%2F13%3A10190410%21RIV14-MSM-11320___/
rdfshttp://www.w3.org/2000/01/rdf-schema#
n13http://bibframe.org/vocab/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n6http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n9http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n16http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n14http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n19http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n10http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F13%3A10190410%21RIV14-MSM-11320___
rdf:type
n7:Vysledek skos:Concept
rdfs:seeAlso
http://iopscience.iop.org/2043-6262/4/2/025004/
dcterms:description
Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiH x phase ( x < 0.66) was formed under such a high H pressure. Multilayered thin films of Ti-TiO 2 system have been investigated, focusing on all of the important parameters in both photocatalysis and H storage. Numerous Ti-TiO 2 thin films with a single-, bi- and tri-layered structure have been deposited on different substrates by means of dc pulsed magnetron sputtering from a metallic Ti target in an inert Ar or reactive Ar + O 2 atmosphere. The film chemical composition, depth profile, layer thickness and structure were determined by combined analysis of x-ray diffraction, x-ray reflectometry, Rutherford back- scattering and optical reflectivity spectra. The results show that the Ti films deposited on Si(111) exhibit a strong preferred orientation with the (00.1) plane parallel to the substrate, while a columnar structure was developed for TiO 2 films. H charging at 1 bar and at 300 oC revealed that, in the case of the tri-layered structure of Ti/TiO 2 /Ti/Si(111), H diffused through the TiO 2 layer without any accumulation in it. Pd acts as a catalyst for gathering H in Ti layers and up to 50% of H is stored in the topmost and bottom Ti layers. The preferential orientation in the Ti films was found to be destroyed upon hydrogenation at 100 bar. The hydride TiH x phase ( x < 0.66) was formed under such a high H pressure.
dcterms:title
Hydrogen storage in Ti-TiO 2 multilayers Hydrogen storage in Ti-TiO 2 multilayers
skos:prefLabel
Hydrogen storage in Ti-TiO 2 multilayers Hydrogen storage in Ti-TiO 2 multilayers
skos:notation
RIV/00216208:11320/13:10190410!RIV14-MSM-11320___
n7:predkladatel
n17:orjk%3A11320
n4:aktivita
n16:I
n4:aktivity
I
n4:cisloPeriodika
2
n4:dodaniDat
n10:2014
n4:domaciTvurceVysledku
n5:6715869 n5:3399087 n5:6586805
n4:druhVysledku
n19:J
n4:duvernostUdaju
n9:S
n4:entitaPredkladatele
n20:predkladatel
n4:idSjednocenehoVysledku
78478
n4:idVysledku
RIV/00216208:11320/13:10190410
n4:jazykVysledku
n14:eng
n4:klicovaSlova
multilayers; Ti-TiO; storage; Hydrogen
n4:klicoveSlovo
n6:storage n6:Hydrogen n6:multilayers n6:Ti-TiO
n4:kodStatuVydavatele
GB - Spojené království Velké Británie a Severního Irska
n4:kontrolniKodProRIV
[542ECE47299E]
n4:nazevZdroje
Advances in Natural Sciences: Nanoscience and Nanotechnology
n4:obor
n18:BM
n4:pocetDomacichTvurcuVysledku
3
n4:pocetTvurcuVysledku
9
n4:rokUplatneniVysledku
n10:2013
n4:svazekPeriodika
4
n4:tvurceVysledku
Tarnawski, Z. Drogowska, K. Zakrzewska, K. Sechovský, Vladimír Nhu-Tarnawska, K. Balogh, A. G. Kužel, Radomír Havela, Ladislav Brudnik, A.
s:issn
2043-6262
s:numberOfPages
11
n13:doi
10.1088/2043-6262/4/2/025004
n15:organizacniJednotka
11320