This HTML5 document contains 48 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
n10http://linked.opendata.cz/ontology/domain/vavai/riv/typAkce/
dctermshttp://purl.org/dc/terms/
n19http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F00216208%3A11320%2F12%3A10133150%21RIV13-GA0-11320___/
n18http://purl.org/net/nknouf/ns/bibtex#
n16http://localhost/temp/predkladatel/
n12http://linked.opendata.cz/resource/domain/vavai/projekt/
n7http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n21http://linked.opendata.cz/resource/domain/vavai/subjekt/
n6http://linked.opendata.cz/ontology/domain/vavai/
n23https://schema.org/
shttp://schema.org/
rdfshttp://www.w3.org/2000/01/rdf-schema#
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n9http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n20http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n8http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n22http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n14http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n4http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F12%3A10133150%21RIV13-GA0-11320___
rdf:type
n6:Vysledek skos:Concept
rdfs:seeAlso
http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_214_f2_Kluson.pdf
dcterms:description
The main parameter, which determines the properties of the growing thin film, is energy delivered to the surface by impacting particles. In this paper, we concern with the energy distributions of ions in the magnetron discharge designated for the deposition of Ti layers. The measurements were performed by means of a combined energy and mass analyzer. This device enables measurement of energy distributions of individual species. It is well known that in magnetron sputtering different regimes of the discharge excitation can lead to substantial distinctions of the plasma parameters. Here we focused on the pulsed regime. Energies of dominant ions 40Ar+ and 48Ti+ measured in time synchronization with voltage pulses on the cathode are reported. There is a significant abundance of particles with higher energies in the distribution of Ti ions. On the contrary, the energy of Ar ions corresponds to the value of plasma potential. This observation is explained by different ways of origin of these two ions. The influence of the repetition frequency is shown on the time course of the mean energy. Since the results obtained by means of plasma monitor cannot be straightforwardly interpreted as energy distribution functions, a brief theoretical description of the measurement is given at first. The main parameter, which determines the properties of the growing thin film, is energy delivered to the surface by impacting particles. In this paper, we concern with the energy distributions of ions in the magnetron discharge designated for the deposition of Ti layers. The measurements were performed by means of a combined energy and mass analyzer. This device enables measurement of energy distributions of individual species. It is well known that in magnetron sputtering different regimes of the discharge excitation can lead to substantial distinctions of the plasma parameters. Here we focused on the pulsed regime. Energies of dominant ions 40Ar+ and 48Ti+ measured in time synchronization with voltage pulses on the cathode are reported. There is a significant abundance of particles with higher energies in the distribution of Ti ions. On the contrary, the energy of Ar ions corresponds to the value of plasma potential. This observation is explained by different ways of origin of these two ions. The influence of the repetition frequency is shown on the time course of the mean energy. Since the results obtained by means of plasma monitor cannot be straightforwardly interpreted as energy distribution functions, a brief theoretical description of the measurement is given at first.
dcterms:title
Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge
skos:prefLabel
Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge Energy Resolved Ion Mass Spectroscopy of the Pulsed Magnetron Discharge
skos:notation
RIV/00216208:11320/12:10133150!RIV13-GA0-11320___
n6:predkladatel
n21:orjk%3A11320
n3:aktivita
n8:S n8:P
n3:aktivity
P(GAP205/11/0386), P(GD202/03/H162), S
n3:dodaniDat
n4:2013
n3:domaciTvurceVysledku
n7:6779263 n7:1276816 n7:2535777 Perekrestov, Roman
n3:druhVysledku
n14:D
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n19:predkladatel
n3:idSjednocenehoVysledku
134384
n3:idVysledku
RIV/00216208:11320/12:10133150
n3:jazykVysledku
n15:eng
n3:klicovaSlova
Pulsed magnetron discharge; Energy resolved ion mass spectroscopy
n3:klicoveSlovo
n9:Pulsed%20magnetron%20discharge n9:Energy%20resolved%20ion%20mass%20spectroscopy
n3:kontrolniKodProRIV
[F0C1FF64DB2E]
n3:mistoKonaniAkce
Praha
n3:mistoVydani
Praha
n3:nazevZdroje
WDS'12 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
n3:obor
n22:BL
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n12:GAP205%2F11%2F0386 n12:GD202%2F03%2FH162
n3:rokUplatneniVysledku
n4:2012
n3:tvurceVysledku
Perekrestov, Roman Tichý, Milan Kudrna, Pavel Klusoň, Jan
n3:typAkce
n10:EUR
n3:zahajeniAkce
2012-05-29+02:00
s:numberOfPages
6
n18:hasPublisher
Matfyzpress
n23:isbn
978-80-7378-225-2
n16:organizacniJednotka
11320