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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F12%3A10133144%21RIV13-GA0-11320___
rdf:type
skos:Concept n17:Vysledek
rdfs:seeAlso
http://www.mff.cuni.cz/veda/konference/wds/proc/pdf12/WDS12_206_f2_Perekrestov.pdf
dcterms:description
Hollow cathode plasma jet (HCPJ) sputtering technique, history and comparisons with another plasma sources are reviewed in this article. Properties, characteristics and deposition features of the Ti and TixOy films are considered. The approach of quartz crystal microbalance (QCM) usage and calibration is shown. First results of Ti/TiO2 thin films deposited on Si substrate are presented in the end. Hollow cathode plasma jet (HCPJ) sputtering technique, history and comparisons with another plasma sources are reviewed in this article. Properties, characteristics and deposition features of the Ti and TixOy films are considered. The approach of quartz crystal microbalance (QCM) usage and calibration is shown. First results of Ti/TiO2 thin films deposited on Si substrate are presented in the end.
dcterms:title
Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet
skos:prefLabel
Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet Ti/TiO2 Thin Films Deposition by Means of Hollow Cathode Plasma Jet
skos:notation
RIV/00216208:11320/12:10133144!RIV13-GA0-11320___
n17:predkladatel
n18:orjk%3A11320
n3:aktivita
n5:S n5:P
n3:aktivity
P(GAP205/11/0386), P(GD202/03/H162), S
n3:dodaniDat
n7:2013
n3:domaciTvurceVysledku
n4:2535777 n4:1276816 n4:6779263 Perekrestov, Roman
n3:druhVysledku
n15:D
n3:duvernostUdaju
n21:S
n3:entitaPredkladatele
n13:predkladatel
n3:idSjednocenehoVysledku
174531
n3:idVysledku
RIV/00216208:11320/12:10133144
n3:jazykVysledku
n10:eng
n3:klicovaSlova
Hollow cathode plasma jet; Ti/TiO2 thin films
n3:klicoveSlovo
n8:Ti%2FTiO2%20thin%20films n8:Hollow%20cathode%20plasma%20jet
n3:kontrolniKodProRIV
[BB72591F2CF8]
n3:mistoKonaniAkce
Praha
n3:mistoVydani
Praha
n3:nazevZdroje
WDS'12 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
n3:obor
n20:BL
n3:pocetDomacichTvurcuVysledku
4
n3:pocetTvurcuVysledku
4
n3:projekt
n12:GAP205%2F11%2F0386 n12:GD202%2F03%2FH162
n3:rokUplatneniVysledku
n7:2012
n3:tvurceVysledku
Tichý, Milan Kudrna, Pavel Klusoň, Jan Perekrestov, Roman
n3:typAkce
n9:EUR
n3:zahajeniAkce
2012-05-29+02:00
s:numberOfPages
6
n16:hasPublisher
Matfyzpress
n22:isbn
978-80-7378-225-2
n19:organizacniJednotka
11320