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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F11%3A10109734%21RIV12-GA0-11320___
rdf:type
n13:Vysledek skos:Concept
rdfs:seeAlso
http://www.mff.cuni.cz/veda/konference/wds/proc/pdf11/WDS11_244_f2_Pira.pdf
dcterms:description
Ionic crystals are promising materials for testing XUV source in PLD (pulsed laser deposition) arrangement. In this investigation of LiF we use an incidence angle of 20o to study characteristics of ablation and laser-matter interaction under conditions similar as in the PLD arrangement. Single-shot ablation threshold was determined. Also CaF2 was irradiated by XUV radiation and ablation threshold relative to LiF was determined. Irradiated samples have been investigated by Nomarski (DIC-Differential Interference Contrast) microscopy and optical profiler (WLI-white light interferometry). Ionic crystals are promising materials for testing XUV source in PLD (pulsed laser deposition) arrangement. In this investigation of LiF we use an incidence angle of 20o to study characteristics of ablation and laser-matter interaction under conditions similar as in the PLD arrangement. Single-shot ablation threshold was determined. Also CaF2 was irradiated by XUV radiation and ablation threshold relative to LiF was determined. Irradiated samples have been investigated by Nomarski (DIC-Differential Interference Contrast) microscopy and optical profiler (WLI-white light interferometry).
dcterms:title
Study of Ablation Threshold of Ionic Crystals for Capillary-discharge XUV Laser Radiation Study of Ablation Threshold of Ionic Crystals for Capillary-discharge XUV Laser Radiation
skos:prefLabel
Study of Ablation Threshold of Ionic Crystals for Capillary-discharge XUV Laser Radiation Study of Ablation Threshold of Ionic Crystals for Capillary-discharge XUV Laser Radiation
skos:notation
RIV/00216208:11320/11:10109734!RIV12-GA0-11320___
n13:predkladatel
n15:orjk%3A11320
n3:aktivita
n4:P n4:Z n4:S
n3:aktivity
P(GAP108/11/1312), S, Z(MSM0021620834)
n3:dodaniDat
n21:2012
n3:domaciTvurceVysledku
n11:9517421 n11:1085336 n11:6624138
n3:druhVysledku
n18:D
n3:duvernostUdaju
n14:S
n3:entitaPredkladatele
n8:predkladatel
n3:idSjednocenehoVysledku
233021
n3:idVysledku
RIV/00216208:11320/11:10109734
n3:jazykVysledku
n19:eng
n3:klicovaSlova
XUV laser; Capillary-discharge; Ionic crystals; Ablation threshold
n3:klicoveSlovo
n6:Ablation%20threshold n6:Ionic%20crystals n6:Capillary-discharge n6:XUV%20laser
n3:kontrolniKodProRIV
[9AFDEF00D351]
n3:mistoKonaniAkce
Praha
n3:mistoVydani
Praha
n3:nazevZdroje
WDS'11 Proceedings of Contributed Papers: Part II – Physics of Plasmas and Ionized Media
n3:obor
n9:BL
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
9
n3:projekt
n5:GAP108%2F11%2F1312
n3:rokUplatneniVysledku
n21:2011
n3:tvurceVysledku
Wild, Jan Vyšín, L. Juha, L. Zelinger, Z. Pira, Peter Lančok, J. Burian, Tomáš Střižík, M. Rocca, J. J.
n3:typAkce
n17:CST
n3:zahajeniAkce
2011-05-31+02:00
n3:zamer
n22:MSM0021620834
s:numberOfPages
5
n10:hasPublisher
Matfyzpress
n20:isbn
978-80-7378-185-9
n23:organizacniJednotka
11320