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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F11%3A10108201%21RIV12-GA0-11320___
rdf:type
skos:Concept n18:Vysledek
rdfs:seeAlso
http://dx.doi.org/10.1016/j.apsusc.2011.09.025
dcterms:description
Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadium presented under the surface resulted in a weakening of CO-metal surface bond, a change in the proportion of the adsorption side species, and an increase of CO dissociation. (C) 2011 Elsevier B. V. All rights reserved. Alumina-supported mixed bimetallic Rh-V thin films, with the overall thickness of 0.8 ML, were prepared under the ultrahigh vacuum (UHV) conditions and characterized with respect to their electronic and CO adsorption properties. X-ray photoelectron spectroscopy (XPS) was utilized to characterize electronic changes accompanying bimetallic Rh-V interaction and interaction between metal and polycrystalline gamma-Al(2)O(3) substrate. The chemisorption properties were probed by temperature-programmed desorption spectroscopy (TPD) of CO molecules. The electronic and chemisorption properties of the mixed layers were compared with pure Rh and V layers grown on the same gamma-Al(2)O(3) substrate and with a model bimetallic Rh-V system prepared by V deposition on a polycrystalline Rh foil. By varying the preparation conditions, we observed a strong dependence of the studied properties on the position of the V atoms. The presence of V atoms on the surface led to a fast deactivation, while vanadium presented under the surface resulted in a weakening of CO-metal surface bond, a change in the proportion of the adsorption side species, and an increase of CO dissociation. (C) 2011 Elsevier B. V. All rights reserved.
dcterms:title
XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina
skos:prefLabel
XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina XPS and TPD investigation of CO adsorption on mixed Rh-V layers supported by gamma-alumina
skos:notation
RIV/00216208:11320/11:10108201!RIV12-GA0-11320___
n18:predkladatel
n20:orjk%3A11320
n4:aktivita
n13:S n13:P n13:Z
n4:aktivity
P(GD202/09/H041), S, Z(MSM0021620834)
n4:cisloPeriodika
2
n4:dodaniDat
n16:2012
n4:domaciTvurceVysledku
n9:3529479 n9:8636303 n9:3283968
n4:druhVysledku
n11:J
n4:duvernostUdaju
n17:S
n4:entitaPredkladatele
n5:predkladatel
n4:idSjednocenehoVysledku
241975
n4:idVysledku
RIV/00216208:11320/11:10108201
n4:jazykVysledku
n21:eng
n4:klicovaSlova
Carbon monoxide; Vanadium; Rhodium; Temperature programmed desorption; X-ray photoelectron spectroscopy; Model catalyst
n4:klicoveSlovo
n7:Vanadium n7:X-ray%20photoelectron%20spectroscopy n7:Temperature%20programmed%20desorption n7:Rhodium n7:Model%20catalyst n7:Carbon%20monoxide
n4:kodStatuVydavatele
NL - Nizozemsko
n4:kontrolniKodProRIV
[AD49EA0F99B1]
n4:nazevZdroje
Applied Surface Science
n4:obor
n8:BM
n4:pocetDomacichTvurcuVysledku
3
n4:pocetTvurcuVysledku
3
n4:projekt
n12:GD202%2F09%2FH041
n4:rokUplatneniVysledku
n16:2011
n4:svazekPeriodika
258
n4:tvurceVysledku
Nehasil, Václav Matolín, Vladimír Píš, Igor
n4:wos
000296525800042
n4:zamer
n19:MSM0021620834
s:issn
0169-4332
s:numberOfPages
6
n15:doi
10.1016/j.apsusc.2011.09.025
n22:organizacniJednotka
11320