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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F11%3A10104983%21RIV12-AV0-11320___
rdf:type
skos:Concept n8:Vysledek
rdfs:seeAlso
http://onlinelibrary.wiley.com/doi/10.1002/ppap.201000126/full
dcterms:description
Titanium nanocluster films were prepared using a gas aggregation cluster source based on a planar magnetron following a Haberland concept and using Ar as a working gas. The films were deposited in dependence on the argon pressure inside the cluster source and on the magnetron current. Prior to the analysis, deposited metal nanocluster films were allowed to oxidize in air at room temperature. Selected nanocluster films were annealed in air at 420 degrees C. The films were studied by TEM, SEM, and AFM in order to describe their morphology and topography. Crystal structure of the nanoclusters was estimated from electron diffraction patterns by SAD analysis. Chemical composition of the film surface was determined by XPS. Special attention was paid to describing the changes in the nanocluster films connected with ageing. Titanium nanocluster films were prepared using a gas aggregation cluster source based on a planar magnetron following a Haberland concept and using Ar as a working gas. The films were deposited in dependence on the argon pressure inside the cluster source and on the magnetron current. Prior to the analysis, deposited metal nanocluster films were allowed to oxidize in air at room temperature. Selected nanocluster films were annealed in air at 420 degrees C. The films were studied by TEM, SEM, and AFM in order to describe their morphology and topography. Crystal structure of the nanoclusters was estimated from electron diffraction patterns by SAD analysis. Chemical composition of the film surface was determined by XPS. Special attention was paid to describing the changes in the nanocluster films connected with ageing.
dcterms:title
Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source
skos:prefLabel
Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source Morphology of Titanium Nanocluster Films Prepared by Gas Aggregation Cluster Source
skos:notation
RIV/00216208:11320/11:10104983!RIV12-AV0-11320___
n8:predkladatel
n9:orjk%3A11320
n3:aktivita
n15:Z n15:P
n3:aktivity
P(KAN101120701), Z(MSM0021620834)
n3:cisloPeriodika
7
n3:dodaniDat
n20:2012
n3:domaciTvurceVysledku
n4:9253378 n4:8563047 n4:4473515 n4:8231109 n4:3908151 n4:2020645 n4:3650464 n4:8014434 n4:8972354 n4:8465533 n4:6889166 n4:4603443
n3:druhVysledku
n19:J
n3:duvernostUdaju
n16:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
213777
n3:idVysledku
RIV/00216208:11320/11:10104983
n3:jazykVysledku
n5:eng
n3:klicovaSlova
TiO(2); nanocluster; morphology; gas aggregation cluster source; ageing
n3:klicoveSlovo
n18:morphology n18:TiO%282%29 n18:ageing n18:gas%20aggregation%20cluster%20source n18:nanocluster
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[6F7557FBC62C]
n3:nazevZdroje
Plasma Processes and Polymers
n3:obor
n21:BM
n3:pocetDomacichTvurcuVysledku
12
n3:pocetTvurcuVysledku
12
n3:projekt
n22:KAN101120701
n3:rokUplatneniVysledku
n20:2011
n3:svazekPeriodika
8
n3:tvurceVysledku
Shukurov, Andrey Solař, Pavel Biederman, Hynek Artemenko, Anna Pešička, Josef Kylián, Ondřej Matolínová, Iva Slavínská, Danka Drábik, Martin Matoušek, Jindřich Kousal, Jaroslav Polonskyi, Oleksandr
n3:wos
000293273400007
n3:zamer
n12:MSM0021620834
s:issn
1612-8850
s:numberOfPages
11
n11:doi
10.1002/ppap.201000126
n7:organizacniJednotka
11320