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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F10%3A10071401%21RIV11-MSM-11320___
rdf:type
skos:Concept n18:Vysledek
dcterms:description
The desktop capillary-discharge Ne-like Ar laser (CDL) providing 10-?J nanosecond pulses of coherent 46.9-nm radiation with a repetition rate up to 10 Hz was used to modify surfaces of various materials, e.g., metals, carbonaceous material and organic polymer. The purpose of this investigation is to found a correlation between the CDL-induced surface damage and physico-chemical properties of irradiated material (i.e., radiation attenuation length in the material, which is given mostly by elemental composition and density, cohesive energy and so on). The influence of XUV radiation on the surfaces is estimated by Nomarski (DIC) microscope. The desktop capillary-discharge Ne-like Ar laser (CDL) providing 10-?J nanosecond pulses of coherent 46.9-nm radiation with a repetition rate up to 10 Hz was used to modify surfaces of various materials, e.g., metals, carbonaceous material and organic polymer. The purpose of this investigation is to found a correlation between the CDL-induced surface damage and physico-chemical properties of irradiated material (i.e., radiation attenuation length in the material, which is given mostly by elemental composition and density, cohesive energy and so on). The influence of XUV radiation on the surfaces is estimated by Nomarski (DIC) microscope.
dcterms:title
The Interaction of Extreme Ultraviolet (XUV) Laser Radiation with Various Surfaces The Interaction of Extreme Ultraviolet (XUV) Laser Radiation with Various Surfaces
skos:prefLabel
The Interaction of Extreme Ultraviolet (XUV) Laser Radiation with Various Surfaces The Interaction of Extreme Ultraviolet (XUV) Laser Radiation with Various Surfaces
skos:notation
RIV/00216208:11320/10:10071401!RIV11-MSM-11320___
n4:aktivita
n19:S n19:P n19:Z
n4:aktivity
P(IAAX00100903), S, Z(MSM0021620834)
n4:dodaniDat
n13:2011
n4:domaciTvurceVysledku
n20:6624138 n20:1085336
n4:druhVysledku
n15:D
n4:duvernostUdaju
n22:S
n4:entitaPredkladatele
n9:predkladatel
n4:idSjednocenehoVysledku
264382
n4:idVysledku
RIV/00216208:11320/10:10071401
n4:jazykVysledku
n16:eng
n4:klicovaSlova
capillary discharge; XUV laser
n4:klicoveSlovo
n17:capillary%20discharge n17:XUV%20laser
n4:kontrolniKodProRIV
[E5CB219845B7]
n4:mistoKonaniAkce
Praha
n4:mistoVydani
Praha
n4:nazevZdroje
WDS'10 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
n4:obor
n5:BL
n4:pocetDomacichTvurcuVysledku
2
n4:pocetTvurcuVysledku
7
n4:projekt
n7:IAAX00100903
n4:rokUplatneniVysledku
n13:2010
n4:tvurceVysledku
Toufarová, M. Pira, Peter Chalupský, J. Vyšín, L. Burian, Tomáš Wild, Jan Juha, L.
n4:typAkce
n21:EUR
n4:zahajeniAkce
2010-06-01+02:00
n4:zamer
n6:MSM0021620834
s:numberOfPages
3
n8:hasPublisher
Matfyzpress
n12:isbn
978-80-7378-140-8
n14:organizacniJednotka
11320