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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F10%3A10071393%21RIV11-MSM-11320___
rdf:type
skos:Concept n19:Vysledek
dcterms:description
In presented work, X-ray Photoelectron Spectroscopy (XPS) was used to study interaction of gallium deposited on different metal-oxide surfaces. CeOx/Si, gama-Al2O3, Al2O3/Al, Al foil and Si were used as substrates. Ga was deposited in number of steps up to a thickness of several nanometers. Prepared samples were further studied under different temperature conditions. Gallium oxidation state was determined by Auger parameter analysis. Interaction of gallium with highly oxidized substrates led to gallium oxidation. The interaction of gallium with surface was strongly influenced by oxidation state of particular substrate. In addition, strong interaction between gallium and CeOx support occurred. In presented work, X-ray Photoelectron Spectroscopy (XPS) was used to study interaction of gallium deposited on different metal-oxide surfaces. CeOx/Si, gama-Al2O3, Al2O3/Al, Al foil and Si were used as substrates. Ga was deposited in number of steps up to a thickness of several nanometers. Prepared samples were further studied under different temperature conditions. Gallium oxidation state was determined by Auger parameter analysis. Interaction of gallium with highly oxidized substrates led to gallium oxidation. The interaction of gallium with surface was strongly influenced by oxidation state of particular substrate. In addition, strong interaction between gallium and CeOx support occurred.
dcterms:title
Study of Gallium Interaction with Metal-oxide Surfaces Study of Gallium Interaction with Metal-oxide Surfaces
skos:prefLabel
Study of Gallium Interaction with Metal-oxide Surfaces Study of Gallium Interaction with Metal-oxide Surfaces
skos:notation
RIV/00216208:11320/10:10071393!RIV11-MSM-11320___
n3:aktivita
n6:S
n3:aktivity
S
n3:dodaniDat
n11:2011
n3:domaciTvurceVysledku
n4:4895487 n4:3283968
n3:druhVysledku
n18:D
n3:duvernostUdaju
n12:S
n3:entitaPredkladatele
n8:predkladatel
n3:idSjednocenehoVysledku
290779
n3:idVysledku
RIV/00216208:11320/10:10071393
n3:jazykVysledku
n20:eng
n3:klicovaSlova
photoelectron spectroscopy; metal oxides, oxidation; gallium
n3:klicoveSlovo
n5:gallium n5:metal%20oxides n5:oxidation n5:photoelectron%20spectroscopy
n3:kontrolniKodProRIV
[0EE71163091F]
n3:mistoKonaniAkce
Praha
n3:mistoVydani
Praha
n3:nazevZdroje
WDS'10 Proceedings of Contributed Papers: Part III - Physics
n3:obor
n15:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
2
n3:rokUplatneniVysledku
n11:2010
n3:tvurceVysledku
Nehasil, Václav Zahoranová, Tatiana
n3:typAkce
n9:EUR
n3:zahajeniAkce
2010-06-01+02:00
s:numberOfPages
6
n14:hasPublisher
Matfyzpress
n16:isbn
978-80-7378-141-5
n17:organizacniJednotka
11320