This HTML5 document contains 48 embedded RDF statements represented using HTML+Microdata notation.

The embedded RDF content will be recognized by any processor of HTML5 Microdata.

Namespace Prefixes

PrefixIRI
dctermshttp://purl.org/dc/terms/
n17http://localhost/temp/predkladatel/
n4http://linked.opendata.cz/resource/domain/vavai/riv/tvurce/
n16http://linked.opendata.cz/ontology/domain/vavai/
n11http://linked.opendata.cz/resource/domain/vavai/zamer/
shttp://schema.org/
skoshttp://www.w3.org/2004/02/skos/core#
n3http://linked.opendata.cz/ontology/domain/vavai/riv/
n2http://linked.opendata.cz/resource/domain/vavai/vysledek/
rdfhttp://www.w3.org/1999/02/22-rdf-syntax-ns#
n14http://linked.opendata.cz/resource/domain/vavai/vysledek/RIV%2F00216208%3A11320%2F10%3A10071368%21RIV11-MSM-11320___/
n18http://linked.opendata.cz/ontology/domain/vavai/riv/klicoveSlovo/
n9http://linked.opendata.cz/ontology/domain/vavai/riv/duvernostUdaju/
xsdhhttp://www.w3.org/2001/XMLSchema#
n15http://linked.opendata.cz/ontology/domain/vavai/riv/jazykVysledku/
n10http://linked.opendata.cz/ontology/domain/vavai/riv/aktivita/
n13http://linked.opendata.cz/ontology/domain/vavai/riv/obor/
n6http://linked.opendata.cz/ontology/domain/vavai/riv/druhVysledku/
n8http://reference.data.gov.uk/id/gregorian-year/

Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F10%3A10071368%21RIV11-MSM-11320___
rdf:type
n16:Vysledek skos:Concept
dcterms:description
An epitaxial ultra-thin alumina layer was prepared on Ni(111) by simultaneous Al deposition and oxidation at elevated temperatures. Different deposition procedures lead to creation of oxide layers of various thicknesses and quality. Low-energy electron diffraction revealed epitaxial parameters of the films and the relationship between the nickel substrate and the oxide overlayer. Core-level photoelectron spectroscopy using Al-K-alpha and synchrotron-generated photons show that the oxide-metal interface is formed by oxygen atoms, which is contrary to the case of epitaxial alumina layers prepared by the oxidation of NiAl(110) and Ni3Al(111) surfaces. The results of a photoelectric work function measurement are also discussed. An epitaxial ultra-thin alumina layer was prepared on Ni(111) by simultaneous Al deposition and oxidation at elevated temperatures. Different deposition procedures lead to creation of oxide layers of various thicknesses and quality. Low-energy electron diffraction revealed epitaxial parameters of the films and the relationship between the nickel substrate and the oxide overlayer. Core-level photoelectron spectroscopy using Al-K-alpha and synchrotron-generated photons show that the oxide-metal interface is formed by oxygen atoms, which is contrary to the case of epitaxial alumina layers prepared by the oxidation of NiAl(110) and Ni3Al(111) surfaces. The results of a photoelectric work function measurement are also discussed.
dcterms:title
Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study
skos:prefLabel
Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study Growth of thin epitaxial alumina films onto Ni(111): an electron spectroscopy and diffraction study
skos:notation
RIV/00216208:11320/10:10071368!RIV11-MSM-11320___
n3:aktivita
n10:Z
n3:aktivity
Z(MSM0021620834)
n3:cisloPeriodika
10-11
n3:dodaniDat
n8:2011
n3:domaciTvurceVysledku
n4:2563592 n4:8636303
n3:druhVysledku
n6:J
n3:duvernostUdaju
n9:S
n3:entitaPredkladatele
n14:predkladatel
n3:idSjednocenehoVysledku
261070
n3:idVysledku
RIV/00216208:11320/10:10071368
n3:jazykVysledku
n15:eng
n3:klicovaSlova
thin layer; aluminum oxide; alumina; Ni; LEED; XPS
n3:klicoveSlovo
n18:LEED n18:Ni n18:XPS n18:aluminum%20oxide n18:alumina n18:thin%20layer
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[06AD90BC003E]
n3:nazevZdroje
Surface and Interface Analysis
n3:obor
n13:BM
n3:pocetDomacichTvurcuVysledku
2
n3:pocetTvurcuVysledku
7
n3:rokUplatneniVysledku
n8:2010
n3:svazekPeriodika
42
n3:tvurceVysledku
Kim, Taeyoung Tsud, Nataliya Matolín, Vladimír Yoshitake, Michiko Nemšák, Slavomír Skála, Tomáš Yagyu, Shinjiro
n3:wos
000282668800016
n3:zamer
n11:MSM0021620834
s:issn
0142-2421
s:numberOfPages
4
n17:organizacniJednotka
11320