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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F09%3A00207251%21RIV10-GA0-11320___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
DC energized hollow cathode plasma jet system was examined by moveable Langmuir probe. Spatial distribution of electron concentration, plasma and floating potentials and mean electron energy were obtained from measured probe characteristics. The radial dependence of plasma parameters was measured for distances from the system axis 0-120 mm. Temporal dependences of main plasma parameters for discharges in clean argon and argon-oxygen mixture were obtained from probe voltage current characteristics. The system with Ti nozzle permits deposition of pure Ti as well as its compounds with active working gas admixtures such as O2, N2, etc. TiOx thin films were deposited onto glass substrates and examined by AFM and elipsometry. DC energized hollow cathode plasma jet system was examined by moveable Langmuir probe. Spatial distribution of electron concentration, plasma and floating potentials and mean electron energy were obtained from measured probe characteristics. The radial dependence of plasma parameters was measured for distances from the system axis 0-120 mm. Temporal dependences of main plasma parameters for discharges in clean argon and argon-oxygen mixture were obtained from probe voltage current characteristics. The system with Ti nozzle permits deposition of pure Ti as well as its compounds with active working gas admixtures such as O2, N2, etc. TiOx thin films were deposited onto glass substrates and examined by AFM and elipsometry.
dcterms:title
Spatial Distribution of Plasma Parameters in DC-energized Hollow Cathode Plasma Jet: System Stability Spatial Distribution of Plasma Parameters in DC-energized Hollow Cathode Plasma Jet: System Stability
skos:prefLabel
Spatial Distribution of Plasma Parameters in DC-energized Hollow Cathode Plasma Jet: System Stability Spatial Distribution of Plasma Parameters in DC-energized Hollow Cathode Plasma Jet: System Stability
skos:notation
RIV/00216208:11320/09:00207251!RIV10-GA0-11320___
n3:aktivita
n11:Z n11:S n11:P
n3:aktivity
P(GA202/07/0044), P(GA202/09/0800), S, Z(MSM0021620834)
n3:dodaniDat
n17:2010
n3:domaciTvurceVysledku
n4:6779263 n4:1276816 Leshkov, Sergey n4:8405182 n4:2535777 Chichina, Mariya
n3:druhVysledku
n18:D
n3:duvernostUdaju
n20:S
n3:entitaPredkladatele
n10:predkladatel
n3:idSjednocenehoVysledku
342738
n3:idVysledku
RIV/00216208:11320/09:00207251
n3:jazykVysledku
n19:eng
n3:klicovaSlova
Spatial; Distribution; Plasma; Parameters; DC-energized; Hollow; Cathode; Plasma; System; Stability
n3:klicoveSlovo
n15:Distribution n15:Spatial n15:Cathode n15:Parameters n15:System n15:Plasma n15:Stability n15:DC-energized n15:Hollow
n3:kontrolniKodProRIV
[B9F016A956A0]
n3:mistoKonaniAkce
Prague
n3:mistoVydani
Prague
n3:nazevZdroje
WDS´09 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media
n3:obor
n16:BL
n3:pocetDomacichTvurcuVysledku
6
n3:pocetTvurcuVysledku
6
n3:projekt
n12:GA202%2F09%2F0800 n12:GA202%2F07%2F0044
n3:rokUplatneniVysledku
n17:2009
n3:tvurceVysledku
Klusoň, Jan Picková, Irena Kudrna, Pavel Tichý, Milan Chichina, Mariya Leshkov, Sergey
n3:typAkce
n7:EUR
n3:zahajeniAkce
2009-01-01+01:00
n3:zamer
n6:MSM0021620834
s:numberOfPages
5
n22:hasPublisher
Matfyzpress
n8:isbn
978-80-7378-102-6
n9:organizacniJednotka
11320