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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F09%3A00207230%21RIV10-GA0-11320___
rdf:type
n8:Vysledek skos:Concept
dcterms:description
Chemical-mechanical polishing of CdTe and Zn(x)Cd(1-x)Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H2O2(HNO3)-HBr-solvent has been investigated. The dependences of the chemical-mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry. Chemical-mechanical polishing of CdTe and Zn(x)Cd(1-x)Te single-crystal surfaces by bromine-evolving compositions based on aqueous solutions of H2O2(HNO3)-HBr-solvent has been investigated. The dependences of the chemical-mechanical polishing rate on the dilution of the base polishing etchant for various organic components have been determined. The surface condition after such polishing has been investigated using profilometry.
dcterms:title
Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions
skos:prefLabel
Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions Chemical-Mechanical Polishing of CdTe and Zn(x)Cd(1-x)Te Single Crystals by H2O2(HNO3)-HBr-Organic Solvent Etchant Compositions
skos:notation
RIV/00216208:11320/09:00207230!RIV10-GA0-11320___
n3:aktivita
n9:P n9:Z
n3:aktivity
P(GA102/09/1920), Z(MSM0021620834)
n3:cisloPeriodika
8
n3:dodaniDat
n17:2010
n3:domaciTvurceVysledku
n6:3419991 n6:5805589 n6:4607643
n3:druhVysledku
n10:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n5:predkladatel
n3:idSjednocenehoVysledku
306897
n3:idVysledku
RIV/00216208:11320/09:00207230
n3:jazykVysledku
n19:eng
n3:klicovaSlova
Chemical-Mechanical; Polishing; Single; Crystals; -HBr-Organic; Solvent; Etchant; Compositions
n3:klicoveSlovo
n4:Single n4:Crystals n4:Solvent n4:Polishing n4:-HBr-Organic n4:Etchant n4:Chemical-Mechanical n4:Compositions
n3:kodStatuVydavatele
US - Spojené státy americké
n3:kontrolniKodProRIV
[57DBB3A7576E]
n3:nazevZdroje
Journal of Electronic Materials
n3:obor
n18:BM
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
8
n3:projekt
n11:GA102%2F09%2F1920
n3:rokUplatneniVysledku
n17:2009
n3:svazekPeriodika
38
n3:tvurceVysledku
Höschl, Pavel Bok, Jiří Tomashik, Zinajda F. Okrepka, Galyna M. Stratiychuk, Irina B. Moravec, Pavel Tomashik, Vasyl M. Hnativ, Ivan I.
n3:wos
000268745400020
n3:zamer
n12:MSM0021620834
s:issn
0361-5235
s:numberOfPages
8
n7:organizacniJednotka
11320