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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F09%3A00206828%21RIV10-MSM-11320___
rdf:type
skos:Concept n14:Vysledek
dcterms:description
Very thin metal films deposited on dielectrics consists of small objects distributed on the substrate and the quantitative characterization of objects arrangement can bring information about internal processes in the studied system. In the contribution therefore various morphological algorithms were tested. Very thin metal films deposited on dielectrics consists of small objects distributed on the substrate and the quantitative characterization of objects arrangement can bring information about internal processes in the studied system. In the contribution therefore various morphological algorithms were tested.
dcterms:title
Advanced image analysis and its application in thin film physics Advanced image analysis and its application in thin film physics
skos:prefLabel
Advanced image analysis and its application in thin film physics Advanced image analysis and its application in thin film physics
skos:notation
RIV/00216208:11320/09:00206828!RIV10-MSM-11320___
n3:aktivita
n5:Z n5:P
n3:aktivity
P(KAN101120701), Z(MSM0021620834)
n3:cisloPeriodika
1
n3:dodaniDat
n6:2010
n3:domaciTvurceVysledku
n18:4128710
n3:druhVysledku
n8:J
n3:duvernostUdaju
n19:S
n3:entitaPredkladatele
n17:predkladatel
n3:idSjednocenehoVysledku
302036
n3:idVysledku
RIV/00216208:11320/09:00206828
n3:jazykVysledku
n11:eng
n3:klicovaSlova
Advanced; image; analysis; application; physics
n3:klicoveSlovo
n4:image n4:physics n4:analysis n4:Advanced n4:application
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[777306A42778]
n3:nazevZdroje
Vacuum
n3:obor
n15:BM
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
2
n3:projekt
n16:KAN101120701
n3:rokUplatneniVysledku
n6:2009
n3:svazekPeriodika
84
n3:tvurceVysledku
Hrach, Rudolf Novotný, D.
n3:wos
000270625900068
n3:zamer
n12:MSM0021620834
s:issn
0042-207X
s:numberOfPages
4
n13:organizacniJednotka
11320