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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F09%3A00206793%21RIV10-GA0-11320___
rdf:type
skos:Concept n16:Vysledek
dcterms:description
Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness. Titanium dioxide films have many remarkable properties, for example photocatalytic activity and hydrophilicity. However, these properties depend significantly on the crystallinity, phase composition and microstructure of the films. In this study, crystallization of amorphous films with different thickness (50-2000 nm) deposited on silicon substrates was investigated by XRD in-situ isochronal and isothermal annealing at different temperatures and compared with the post-annealing of both amorphous and nanocrystalline films. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thin films. The process can be well described by the Avrami equation modified by the initial time of crystallization. The parameters of the equation depend on the film thickness.
dcterms:title
Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films
skos:prefLabel
Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films Time and thickness dependence of crystallization of amorphous magnetron deposited TiO2 thin films
skos:notation
RIV/00216208:11320/09:00206793!RIV10-GA0-11320___
n3:aktivita
n9:Z n9:P
n3:aktivity
P(GA106/06/0327), Z(MSM0021620834)
n3:cisloPeriodika
neuveden
n3:dodaniDat
n10:2010
n3:domaciTvurceVysledku
n13:6715869 n13:2407396 n13:3049965
n3:druhVysledku
n11:J
n3:duvernostUdaju
n4:S
n3:entitaPredkladatele
n18:predkladatel
n3:idSjednocenehoVysledku
346339
n3:idVysledku
RIV/00216208:11320/09:00206793
n3:jazykVysledku
n15:eng
n3:klicovaSlova
thickness; dependence; crystallization; amorphous; magnetron; deposited; films
n3:klicoveSlovo
n8:thickness n8:deposited n8:films n8:crystallization n8:amorphous n8:dependence n8:magnetron
n3:kodStatuVydavatele
DE - Spolková republika Německo
n3:kontrolniKodProRIV
[5B0533374FB8]
n3:nazevZdroje
Zeitschrift für Kristallographie
n3:obor
n14:BM
n3:pocetDomacichTvurcuVysledku
3
n3:pocetTvurcuVysledku
5
n3:projekt
n12:GA106%2F06%2F0327
n3:rokUplatneniVysledku
n10:2009
n3:svazekPeriodika
Neuveden
n3:tvurceVysledku
Musil, J. Matěj, Zdeněk Nichtová, Lea Kužel, Radomír Sicha, J.
n3:wos
000271325700003
n3:zamer
n19:MSM0021620834
s:issn
0044-2968
s:numberOfPages
6
n17:organizacniJednotka
11320