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Statements

Subject Item
n2:RIV%2F00216208%3A11320%2F09%3A00206339%21RIV10-MSM-11320___
rdf:type
skos:Concept n10:Vysledek
dcterms:description
Cerium oxide deposited by physical vapor deposition of cerium in an oxygen atmosphere on Cu(111) surface growth epitaxially with CeO2(1 1 1) plane parallel to the Cu(111) plane. The growth and morphology of CeO2(1 1 1) films were investigated by means of low energy electron diffraction (LEED) and scanning tunneling microscopy (STM). LEED shows good long range ordering and STM reveals a three-dimensional growth mode (Vollmer-Weber) with formation of a closed film only at larger thickness. Closed and atomically flat ceria films of larger thickness (3 ML) are obtained by applying a multistep preparation procedure, in which successive ceria layers are homoepitaxially grown on this initial film. The ceria films show similarities with the morphology of CeO2(1 1 1) single crystal surfaces, suggesting the possibility to model bulk ceria by thin film systems. Cerium oxide deposited by physical vapor deposition of cerium in an oxygen atmosphere on Cu(111) surface growth epitaxially with CeO2(1 1 1) plane parallel to the Cu(111) plane. The growth and morphology of CeO2(1 1 1) films were investigated by means of low energy electron diffraction (LEED) and scanning tunneling microscopy (STM). LEED shows good long range ordering and STM reveals a three-dimensional growth mode (Vollmer-Weber) with formation of a closed film only at larger thickness. Closed and atomically flat ceria films of larger thickness (3 ML) are obtained by applying a multistep preparation procedure, in which successive ceria layers are homoepitaxially grown on this initial film. The ceria films show similarities with the morphology of CeO2(1 1 1) single crystal surfaces, suggesting the possibility to model bulk ceria by thin film systems.
dcterms:title
A route to continuous ultra-thin cerium oxide films on Cu(1 1 1) A route to continuous ultra-thin cerium oxide films on Cu(1 1 1)
skos:prefLabel
A route to continuous ultra-thin cerium oxide films on Cu(1 1 1) A route to continuous ultra-thin cerium oxide films on Cu(1 1 1)
skos:notation
RIV/00216208:11320/09:00206339!RIV10-MSM-11320___
n3:aktivita
n11:Z
n3:aktivity
Z(MSM0021620834)
n3:cisloPeriodika
23
n3:dodaniDat
n7:2010
n3:domaciTvurceVysledku
n4:8636303
n3:druhVysledku
n18:J
n3:duvernostUdaju
n13:S
n3:entitaPredkladatele
n16:predkladatel
n3:idSjednocenehoVysledku
301565
n3:idVysledku
RIV/00216208:11320/09:00206339
n3:jazykVysledku
n17:eng
n3:klicovaSlova
route; continuous; ultra-thin; cerium; oxide; films
n3:klicoveSlovo
n8:oxide n8:continuous n8:cerium n8:ultra-thin n8:route n8:films
n3:kodStatuVydavatele
NL - Nizozemsko
n3:kontrolniKodProRIV
[ED0B3DFDD793]
n3:nazevZdroje
Surface Science
n3:obor
n5:BM
n3:pocetDomacichTvurcuVysledku
1
n3:pocetTvurcuVysledku
6
n3:rokUplatneniVysledku
n7:2009
n3:svazekPeriodika
603
n3:tvurceVysledku
Libuda, L. Matolín, Vladimír Hammer, L. Lykhach, Y. Staudt, T. Schneider, M. A.
n3:wos
000272431600009
n3:zamer
n14:MSM0021620834
s:issn
0039-6028
s:numberOfPages
7
n15:organizacniJednotka
11320